Search device, search method and plasma processing apparatus

A search method for searching an input parameter value to be set in a semiconductor processing apparatus which processes an object to be processed into a predetermined processed shape for processing the object to be processed into a target processed shape by using a search device,

• wherein the search device includes a generation unit and an identification unit,
• the generation unit generates a predictive model indicating a relationship between the input parameter value and an output parameter which is a measured value of a processing result processed by setting the input parameter value in the semiconductor processing apparatus based on the input parameter value and the output parameter value,
• the identification unit gives a target output parameter value to the predictive model to predict the input parameter value corresponding to the target output parameter value, and sets the predicted input parameter value in the semiconductor processing apparatus to acquire a measured value of the processing result,
• when the measured value acquired by the identification unit does not satisfy the target processed shape, the generation unit adds the input parameter value predicted by the identification unit and the acquired measured value to generate the predictive model, and
• the generation unit generates the predictive model based on the input parameter value causing defective data and defective substitute data obtained by substituting the measured value which is the defective data when the measured value of the processing result processed by the semiconductor processing apparatus is the defective data.

A plasma processing apparatus for plasma processing a sample by using plasma, comprising:

• a processing chamber;
• a plasma generation device that generates plasma in the processing chamber;
• and
• a control system that searches an input parameter value to be set for processing the sample into a target processed shape and controls the plasma generation device to plasma process the sample placed in the processing chamber according to the searched input parameter value,
• wherein the control system generates a predictive model indicating a relationship between the input parameter value and an output parameter which is a measured value of a processing result processed by setting the input parameter value based on the input parameter value and the output parameter value,
• the control system gives a target output parameter value to the predictive model to predict the input parameter value corresponding to the target output parameter value, and acquires a measured value of the processing result processed by setting the predicted input parameter value,
• when the acquired measured value does not satisfy the target processed shape, the control system adds the predicted input parameter value and the acquired measured value to generate the predictive model,
• when the measured value of the processing result is the defective data, the control system generates the predictive model based on the input parameter value causing the defective data and the defective substitute data obtained by substituting the measured value which is the defective data, and
• when the acquired measured value satisfies the target processed shape, the control system plasma processes the sample placed in the processing chamber according to the predicted input parameter value.

A search device that searches an input parameter value to be set in a semiconductor processing apparatus which processes an object to be processed into a predetermined processed shape for processing the object to be processed into a target processed shape, the search device comprising:

• a processor;
• a storage device;
• and
• a program that is stored in the storage device and executed by the processor to search an input parameter value for processing the object to be processed into the target processed shape,
• wherein the program includes a generation unit and an identification unit,
• the generation unit generates a predictive model indicating a relationship between the input parameter value and an output parameter which is a measured value of a processing result processed by setting the input parameter value in the semiconductor processing apparatus based on the input parameter value and the output parameter value, the identification unit gives a target output parameter value to the predictive model to predict the input parameter value corresponding to the target output parameter value, and sets the predicted input parameter value in the semiconductor processing apparatus to acquire a measured value of the processing result,
• when the measured value acquired by the identification unit does not satisfy the target processed shape, the generation unit adds the input parameter value predicted by the identification unit and the acquired measured value to generate the predictive model, and
• an output parameter representing the processed shape includes a measured value of a top shape and a measured value of a sectional shape of the processing result.