Thin film capacitor, and method of producing thin film capacitor

A method of producing a thin film capacitor, comprising:

• a step of alternately approaching a dielectric substance to a first target containing a metal element M1 as a main component and a second target containing a metal element M2 as a main component;
• a step of having the first target release the metal element M1 therefrom during the step of alternately approaching the dielectric substance thereto to form a first metallic layer on the dielectric substance;
• a step of having the second target release the metal element M2 therefrom and having the first target release the metal element M1 therefrom during the step of alternately approaching the dielectric substance thereto to form one or more laminate structures on the first metallic layer, the one or more laminate structures each having a first metal sublayer containing the metal element M1 as a main component and a second metal sublayer containing the metal element M2 as a main component;
• and
• a step of having the second target release the metal element M2 therefrom and not having the first target release the metal element M1 therefrom during the step of alternately approaching the dielectric substance thereto to form a second metallic layer containing the metal element M2 as a main component on the laminate structures.