US 2019/0294058 A1 · LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

Lithographic apparatus and device manufacturing method

AssigneesASML Netherlands B.V., ASML Holding N.V.

InventorsNicolaas Rudolf Kemper, Henrikus Herman Marie Cox, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Nicolaas Ten Kate, Jeroen Johannes Sophia Maria Mertens, Frits Van Der Meulen, Franciscus Johannes Herman Maria Teunissen, Jan-Gerard Cornelis Van Der Toorn, Martinus Cornelis Maria Verhagen, Stefan Philip Christiaan Belfroid, Johannes Petrus Maria Smeulers, Herman Vogel

Life of this patent

Estimating the term…

Abstract

A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.

Claims20

Dependent claims

A lithographic projection apparatus arranged to project a pattern from a patterning device onto a substrate using a projection system and having a liquid supply system arranged to supply a liquid to a space between the projection system and the substrate, comprising a liquid removal system including:

a conduit having an open end adjacent a volume in which liquid will be present;
a porous member between the end of the conduit and the volume;
and
a suction device arranged to create a pressure differential across the porous member.

1 more element

Dependencies are inferred from the claim text.

Facts

Application

16/438,765Filed 12 Jun 2019

Priority

19 Aug 2004

Published

26 Sep 2019

Term ends

Not estimatedThe source records don’t support an estimate.

Classification6 codes

G03F 7/70883
Environment aspects, e.g. pressure of beam-path gas, temperature: of optical system
G03F 7/70341
Mask projection systems: details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
G03F 7/70858
Construction of apparatus, e.g. environment aspects, hygiene aspects or materials: environment aspects, e.g. pressure of beam-path gas, temperature
G03F 7/70866
Environment aspects, e.g. pressure of beam-path gas, temperature: of mask or workpiece

Family

Application10/921,348Continuation · filed 19 Aug 2004

Application12/714,829Continuation · filed 1 Mar 2010

Application13/223,952Continuation · filed 1 Sep 2011

Application14/273,335Continuation · filed 8 May 2014

Application15/293,009Continuation · filed 13 Oct 2016

Application15/687,938Continuation · filed 28 Aug 2017

Application16/438,765Continuation

US 10,331,047 B2Related patent

US 10,599,054 B2Related patent

US 2006/0038968 A1Published application

US 2010/0149514 A1Published application