Positive photosensitive composition, pattern using same, and method of manufacturing pattern
AssigneeAdeka Corporation
InventorsTaiki MIHARA, Junya MIYAKE, Naomi SATO
Life of this patent
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AssigneeAdeka Corporation
InventorsTaiki MIHARA, Junya MIYAKE, Naomi SATO
Estimating the term…
Provided are: a positive photosensitive composition that exhibits excellent sensitivity at a time of being cured; a pattern using the same; and a method of producing a pattern. The positive photosensitive composition contains: a sulfonic acid derivative compound (A) represented by Formula (I) below, where X1 represents a linear or branched alkyl group having 1 to 14 carbon atoms or the like; and R1 represents a group represented by an aliphatic hydrocarbon group, an aryl group, an arylalkyl group, an acyl group-substituted aryl group, an alicyclic hydrocarbon group or the like, which aliphatic hydrocarbon group, aryl group or arylalkyl group has no substituent or is optionally substituted with a halogen atom or the like; and a polymer compound (B) required to contain a structural unit represented by Formula (III) below, where R5 represents a hydrogen atom or a methyl group; R6 represents an alkyl group having 1 to 4 carbon atoms or the like; f represents a number of 0 to 4; and symbols “*” mean that this group is bound with adjacent groups at the sites “*”:
-6. (canceled)
A positive photosensitive composition comprising:
Dependencies are inferred from the claim text.