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US 2019/0293924 A1Published application
Method and device for exposure of photosensitive layer
AssigneeEV Group E. Thallner GmbH
InventorsBernhard Thallner, Boris Povazay
Life of this patent
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Abstract
A method for exposing a light-sensitive layer to light using an optical system, wherein at least one light beam is generated by respectively at least one light source and pixels of an exposure pattern grid are illuminated by at least one micro-mirror device with a plurality of micro-mirrors. An affine distortion takes place, in particular a shearing, of the exposure pattern grid.
Claims5
A method for exposing a light-sensitive layer to light using an optical system having an optical path, said method comprising:
- generating at least one light beam by use of at least one light source, respectively,
- illuminating pixels of an exposure pattern grid by use of at least one micro-mirror device having a plurality of micro-mirrors, and
- shearing horizontal and/or vertical exposure pattern grid lines of the exposure pattern grid, wherein the shearing of a DMD-picture leaving the at least one micro-mirror device is effected along the optical path.
4-5. (canceled)
A device for exposing a light-sensitive layer to light, the device comprising:
- an optical path,
- at least one light source for generating at least one light beam,
- at least one micro-mirror device having a plurality of micro-mirrors, wherein each micro-mirror serves to illuminate one pixel of an exposure pattern grid,
- wherein horizontal and/or vertical exposure pattern grid lines of the exposure pattern grid are sheared, and shearing of a DMD-picture leaving the micro-mirror device is effected along the optical path.
1 more element
Dependencies are inferred from the claim text.