Device for vertical galvanic metal deposition on a substrate

Device for vertical galvanic metal deposition on a substrate, wherein the device comprises at least a first device element and a second device element, which are arranged in a vertical manner parallel to each other;

• wherein the first device element comprises at least a first anode element having a plurality of through-going conduits and at least a first carrier element having a plurality of through-going conduits;
• wherein said at least first anode element and said at least first carrier element are firmly connected to each other;
• wherein the second device element comprises at least a first substrate holder which is adapted to receive at least a first substrate to be treated, wherein said at least first substrate holder is at least partially surrounding the at least first substrate to be treated along its outer frame after receiving it, characterized in that
• the at least first device element further comprises a plurality of plugs, wherein each plug comprises at least a through-going channel, and wherein each plug is arranged in such a way that each plug is running from the backside of the at least first carrier element through a through-going conduit of the at least first carrier element and further through the respective in front lying through-going conduit of the at least first anode element;
• and wherein all of the plugs are detachably connected to the at least first device element.