Treatment apparatus using high frequency waves and method for controlling same
AssigneeLutronic Corporation
InventorKwang Chon Ko
Life of this patent
Estimating the term…
Abstract
The present invention relates to a treatment apparatus using high frequency waves, and to a method for controlling same. The treatment apparatus using high frequency waves comprises: a high frequency wave generating unit; a plurality of needles for providing, into the skin of a user, high frequency energy transferred from the high frequency wave generating unit; and a driving unit for inserting the plurality of needles into the skin of the user, wherein the apparatus further comprises a control unit for controlling the driving unit such that the plurality of needles are inserted into a first target point within the skin and then move to a second target point.
Claims12
A treatment method using an RF treatment apparatus, the treatment method comprising:
- inserting a plurality of needles to a first depth in a subcutaneous area;
- providing RF energy to the first depth of the subcutaneous area through ends of the plurality of needles based on a measured impedance of the first depth;
- locating the plurality of needles to a second depth in the subcutaneous area;
- and
- providing RF energy to the second depth of the subcutaneous area through ends of the plurality of needles based on a measured impedance of the second depth.
A treatment method inserting a plurality needles into a subcutaneous area and providing RF energy through the needles, the treatment method comprising :
- providing RF energy at a first depth of the subcutaneous area based on an impedance of the first depth;
- and
- providing RF energy at a second depth of the subcutaneous area based on an impedance of the second depth.
Dependencies are inferred from the claim text.