Silicon carbide porous body and manufacturing method of the same, and break filter using the silicon carbide porous body and manufacturing method of the break filter
AssigneeCoorsTek, Inc.
InventorsSeiichi FUKUOKA, Hiroki WATANABE
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Abstract
A silicon carbide porous body includes a skeletal structure formed by a plurality of silicon carbide particles bonded to each other, a plurality of pores formed by the skeletal structure, neck parts formed by surface-contacting of adjacent silicon carbide particles, and an average pore size is larger than 3 μm and equal to or smaller than 9 μm, and a porosity ranges from 35% to 55%. A break filter using the silicon carbide porous body enables high performance of collection of particles, prevention of soaring up of particles, and shortening of a restoration time from the depressurized state of the chamber to the atmospheric state.
Claims7
A silicon carbide porous body, comprising:
- a skeletal structure formed by a plurality of silicon carbide particles bonded to each other;
- a plurality of pores formed by the skeletal structure;
- and
- neck parts formed by surface-contacting of adjacent silicon carbide particles, wherein
- an average pore size is larger than 3 μm and equal to or smaller than 9 μm and
- a porosity of the silicon carbide porous body ranges from 35% to 55%.
A manufacturing method of a silicon carbide porous body to be used to a break filter being placed at a gas inlet of the semiconductor processing apparatus, comprising steps of:
- mixing silicon carbide particles having average diameters ranging from 0.5 μm to 5 μm with added an organic binder;
- and
- sintering a mixture of the silicon carbide particles and the organic binder at a temperature ranging from 2200° C. to 2400° C. in a non-oxidizing atmosphere after forming.
Dependencies are inferred from the claim text.