Polishing pad and method for manufacturing same
AssigneeTeijin Frontier Co., Ltd.
InventorsTateki YAMAUCHI, Mie KAMIYAMA
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Abstract
The present invention addresses the problem of providing: a polishing pad that is long-lasting, has a high polish rate, and is capable of producing a high degree of flatness on polished articles; and a method for manufacturing the polishing pad. The solution provided is to eliminate a sea component from a non-woven fabric that includes a binder fabric and a sea-island type composite fiber composed of the sea component and an island component, the island component having a diameter of 10-2500 nm, and to add a polymer elastic body to the non-woven fabric.
Claims15
A polishing pad, comprising ultra-fine fibers having a fiber diameter of 10 to 2500 nm, binder fibers, and an elastomer.
A method for the production of a polishing pad, comprising the steps of:
- removing a sea component from a non-woven fabric comprising sea-island-type composite fibers having the sea component and an island component having an island diameter of 10 to 2500 nm, and binder fibers, and
- imparting an elastomer to the non-woven fabric.
Dependencies are inferred from the claim text.