Mask structure and manufacturing method thereof
AssigneeUnimicron Technology Corp.
InventorsPu-Ju Lin, Shih-Lian Cheng, Yu-Hua Chen, Cheng-Ta Ko, Jui-Jung Chien, Wei-Tse Ho
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Abstract
A mask structure and a manufacturing method of the mask structure are provided. The mask structure includes a transparent substrate, a patterned metal layer, and a plurality of microlens structures. The patterned metal layer is disposed on the transparent substrate and exposing a portion of the transparent substrate. The microlens structures are disposed on the transparent substrate exposed by a portion of the patterned metal layer and being in contact with the portion of the patterned metal layer.
Claims9
A mask structure, comprising:
- a transparent substrate;
- a patterned metal layer, disposed on the transparent substrate and exposing a portion of the transparent substrate;
- and
- a plurality of microlens structures, disposed on the transparent substrate exposed by a portion of the patterned metal layer and being in contact with the portion of the patterned metal layer.
A manufacturing method of a mask structure, comprising:
- providing a transparent substrate;
- forming a patterned metal layer on the transparent substrate, wherein the patterned metal layer is disposed on the transparent substrate and exposes a portion of the transparent substrate;
- and
- forming a plurality of microlens structures on the transparent substrate exposed by a portion of the patterned metal layer.
Dependencies are inferred from the claim text.