# US 2019/0246480 A1 · Metrology Methods, Radiation Source, Metrology Apparatus and Device Manufacturing Method > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 2019/0246480 A1 - Document ID: US20190246480A1 - Status: Published application - Kind: A1 - Application number: 16/388,519 - Filed: 2019-04-18 - Published: 2019-08-08 - Earliest claimed: 2015-08-12 - Assignees: ASML Netherlands B.V. - Applicants: ASML Netherlands B.V. - Inventors: Alexey Olegovich POLYAKOV; Richard QUINTANILHA; Vadim Yevgenyevich BANINE; Coen Adrianus VERSCHUREN - Web page: https://patentgrep.com/patent/US20190246480A1 ## CPC - H05G 2/00: Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma (X-ray lasers H01S4/00) - G03F 1/84: Inspecting - G03F 7/70625: {Dimensions, e.g. line width, critical dimension [CD], profile, sidewall angle or edge roughness} - G03F 7/70633: {Overlay, i.e. relative alignment between patterns printed by separate exposures in different layers, or in the same layer in multiple exposures or stitching} - G03F 7/7065: {Defects, e.g. optical inspection of patterned layer for defects} - G03F 7/7085: {Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load} - H10P 74/203: {Structural properties, e.g. testing or measuring thicknesses, line widths, warpage, bond strengths or physical defects} - G21K 1/06: using diffraction, refraction or reflection, e.g. monochromators (G21K1/10, G21K7/00 take precedence) - H05G: X-RAY TECHNIQUE (investigating or analysing materials by the use of X-rays G01N23/00; apparatus for X-ray photography G03B42/02; X-ray tubes H01J35/00; TV systems having X-ray input H04N5/321) - G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G) - H10P: GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10 - G21K: HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES ## Abstract A target structure (T) made by lithography or used in lithography is inspected by irradiating the structure at least a first time with EUV radiation (304) generated by inverse Compton scattering. Radiation (308) scattered by the target structure in reflection or transmission is detected (312) and properties of the target structure are calculated by a processor (340) based on the detected scattered radiation. The radiation may have a first wavelength in the EUV range of 0.1 nm to 125 nm. Using the same source and controlling an electron energy, the structure may be irradiated multiple times with different wavelengths within the EUV range, and/or with shorter (x-ray) wavelengths and/or with longer (UV, visible) wavelengths. By rapid switching of electron energy in the inverse Compton scattering source, irradiation at different wavelengths can be performed several times per second. ## Claims ### Claim 1 A method of measuring a property of a periodic structure, the method comprising: generating a beam of radiation by inverse Compton scattering; directing the beam at the periodic structure; detecting radiation transmitted and diffracted by the periodic structure; and determining the property of the periodic structure based on an asymmetry of diffraction orders of the detected radiation, and wherein the beam has a wavelength between 0.1 to 125 nm. ### Claim 2 (depends on 1) The method of claim 1, wherein the beam has a wavelength between 5 to 125 nm. ### Claim 3 (depends on 1) The method of claim 1, wherein the beam has a wavelength between 10 to 100 nm. ### Claim 4 (depends on 1) The method of claim 1, wherein the determining comprises determining an overlay difference between a feature on a first layer of the periodic structure and a feature on a second layer of the periodic structure corresponding to the feature on the first layer generated by lithographic processes. ### Claim 5 (depends on 1) The method of claim 1, wherein the determining comprises determining one or more of damage and contamination resulting from a lithographic process. ### Claim 6 (depends on 1) The method of claim 1, wherein the determining comprises determining one or more of a structure size, a line thickness, and critical dimension generated by a lithographic process. ### Claim 7 (depends on 1) The method of claim 1, further comprising: generating another beam of radiation by inverse Compton scattering; directing the another beam at the periodic structure; and detecting another radiation transmitted and diffracted by periodic structure, wherein the another beam has a wavelength between 0.1 to 125 nm. ### Claim 8 (depends on 7) The method of claim 7, wherein the directing the beam and the another beam and the detecting the radiation and the another radiation transmitted and diffracted by the periodic structure are completed in less than one second. ### Claim 9 (depends on 1) The method of claim 1, further comprising: generating another radiation by inverse Compton scattering; directing the another beam at another periodic structure; and detecting radiation transmitted and diffracted by the another periodic structure, wherein the another beam has a wavelength between 0.1 to 125 nm. ### Claim 10 (depends on 1) The method of claim 1, wherein the generating comprises delivering a beam of electrons and a beam of photons simultaneously to an interaction point. ### Claim 11 (depends on 10) The method of claim 10, further comprising adjusting the wavelength of the beam of radiation by adjusting an energy of electrons in the beam of electrons. ### Claim 12 (depends on 10) The method of claim 10, wherein the beam of electrons is generated using an electron gun and a linear accelerator. ### Claim 13 A metrology apparatus comprising: a radiation source comprising; an electron source configured to output electrons; a photon source configured to output photons, wherein the electrons and photons arrive at an interaction point simultaneously, wherein the photons have a wavelength between 0.1 to 125 nm after undergoing inverse Compton scattering, and wherein the radiation source is configured to output the photons; an illumination system configured to direct the photons output by the radiation source at a periodic structure; and a detection system configured to detect radiation transmitted and diffracted by the periodic structure, wherein the metrology apparatus is configured to determine a property of the periodic structure based on at least an asymmetry of diffraction orders of the detected radiation. ### Claim 14 (depends on 13) The metrology apparatus of claim 13, wherein the photons have a wavelength between 5 to 125 nm after undergoing inverse Compton scattering. ### Claim 15 (depends on 13) The metrology apparatus of claim 13, wherein the photons have a wavelength between 10 to 100 nm after undergoing inverse Compton scattering. ### Claim 16 (depends on 13) The metrology apparatus of claim 13, wherein the determined property of the periodic structure comprises an overlay difference between a feature of the periodic structure and a feature on the second layer of the periodic structure corresponding to the feature on the first layer generated by lithographic processes. ### Claim 17 (depends on 13) The metrology apparatus of claim 13, wherein the determined property of the periodic structure comprises one or more of a structure size, a line thickness, a critical dimension, a layer composition, a layer thickness, damage, and contamination resulting from a lithographic process. ### Claim 18 (depends on 13) The metrology apparatus of claim 13, further comprising a controller configured to adjust an energy of the electrons to adjust the wavelength. ### Claim 19 (depends on 18) The metrology apparatus of claim 18, wherein the metrology apparatus is configured to cause, at least two times in one second, the controller to adjust the wavelength and the detector to detect the radiation transmitted and diffracted by the periodic structure. ### Claim 20 A lithographic apparatus comprising: an illumination apparatus configured to illuminate a pattern on a patterning device; a projection system configured to project an image of the pattern onto a substrate; a metrology apparatus comprising: a radiation source comprising; an electron source configured to output electrons; a photon source configured to output photons, wherein the electrons and photons arrive at an interaction point simultaneously, wherein the photons have a wavelength between 0.1 to 125 nm after undergoing inverse Compton scattering, and wherein the radiation source is configured to output the photons; an illumination system configured to direct the photons output by the radiation source at a periodic structure; and a detection system configured to detect radiation transmitted and diffracted by the periodic structure, wherein the metrology apparatus is configured to determine a property of the periodic structure based on at least an asymmetry of diffraction orders of the detected radiation.