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US 2019/0240669 A1Published application
Polycrystalline Silicon Fragment, Method for Manufacturing Polycrystalline Silicon Fragment, and Polycrystalline Silicon Block Fracture Device
AssigneeTokuyama Corporation
InventorsKazuhiro Kawaguchi, Masami Fujii, Sho Uchida, Manabu Kondo, Yoshifumi Mito, Nobuaki Yoshimatsu
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Abstract
Polycrystalline silicon fragments obtained by fracturing polycrystalline silicon blocks wherein a content ratio of polycrystalline silicon powder having a particle size of 500 to 1000 μm is 0.1 to 40 ppmw.
Claims5
A polycrystalline silicon block fracture device comprising,
- a fracturing part mechanically fracturing a polycrystalline silicon block material introduced from a material introduction port by a movement of an outside force loading member to produce a polycrystalline silicon fragment including a polycrystalline silicon powder having a particle size of 500 to 1000 μm then discharging from discharging port,
- a falling movement part continuous with a downstream of said fracturing part allowing said polycrystalline silicon fragment discharged from the discharging port to fall by gravity,
- a receiver part positioned at downstream of said falling movement part and receives said polycrystalline silicon fragment after falling through said falling movement part;
- and
- said falling movement part comprises a suction removing part in which at least part of said polycrystalline silicon powder included in said polycrystalline silicon fragment is removed by suctioning to a different direction from said falling direction and
- said suction removing part suctions at a suction rate of 1 to 20 m3/min.
3 more elements
Dependencies are inferred from the claim text.