Thermally-developable photosensitive material and preparation method thereof
AssigneeFUJIFILM Corporation
InventorsYoshihisa HASHI, Munenori SHIMOYAMA, Yoshihiro JIMBO
Life of this patent
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Abstract
Provided is a thermally-developable photosensitive material having a support, an image forming layer, which contains at least a photosensitive silver halide, a non-photosensitive organic silver salt, a reducing agent, and a binder, on one surface of the support, and a non-photosensitive back layer on the other surface of the support, in which either the image forming layer or the image forming layer and the non-photosensitive back layer contain an infrared absorbing dye which absorbs at least infrared having a wavelength equal to or longer than 700 nm. Also provided is a manufacturing method of the thermally-developable photosensitive material.
Claims11
A thermally-developable photosensitive material comprising:
- a support;
- an image forming layer, which contains at least a photosensitive silver halide, a non-photosensitive organic silver salt, a reducing agent, and a binder, on one surface of the support;
- and
- a non-photosensitive back layer on the other surface of the support,
- wherein either the image forming layer or the image forming layer and the non-photosensitive back layer contain an infrared absorbing dye which absorbs at least infrared having a wavelength equal to or longer than 700 nm.
Dependencies are inferred from the claim text.