Flexible substrate of flexible oled display panel and manufacturing method thereof
AssigneeWuhan China Star Optoelectronics Semiconductor Display Technology Co., Ltd.
InventorBin XU
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Abstract
The present invention provides a manufacturing method of a flexible substrate of an OLED display panel including a step S10 of providing a first polyimide layer; a step S20 of forming a first silicon oxide layer on a surface of the first polyimide layer; a step S30 of forming a second silicon oxide layer on a surface of the first silicon oxide layer; a step S40 of forming an amorphous silicon layer on a surface of the second silicon oxide layer; and a step S50 of forming a second polyimide layer on a surface of the amorphous silicon layer.
Claims15
A manufacturing method of a flexible substrate of an OLED display panel, comprising:
- a step S10 of providing a first polyimide layer;
- a step S20 of forming a first silicon oxide layer on a surface of the first polyimide layer;
- a step S30 of forming a second silicon oxide layer on a surface of the first silicon oxide layer;
- a step S40 of forming an amorphous silicon layer on a surface of the second silicon oxide layer;
- and
- a step S50 of forming a second polyimide layer on a surface of the amorphous silicon layer;
- wherein the step S10 further comprises:
- a step S101 of forming a recess array on a side of the first polyimide layer which is away from the first silicon oxide layer.
A manufacturing method of a flexible substrate of an OLED display panel, comprising:
- a step S10 of providing a first polyimide layer;
- a step S20 of forming a first silicon oxide layer on a surface of the first polyimide layer;
- a step S30 of forming a second silicon oxide layer on a surface of the first silicon oxide layer;
- a step S40 of forming an amorphous silicon layer on a surface of the second silicon oxide layer;
- and
- a step S50 of forming a second polyimide layer on a surface of the amorphous silicon layer.
Dependencies are inferred from the claim text.