Nitride semiconductor device
AssigneeNuvoton Technology Corporation
InventorsKuei-Yi Chu, Heng-Kuang Lin, Jung-Tse Tsai, Shih-Po Lin, Chih-Wei Chen
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AssigneeNuvoton Technology Corporation
InventorsKuei-Yi Chu, Heng-Kuang Lin, Jung-Tse Tsai, Shih-Po Lin, Chih-Wei Chen
Estimating the term…
A nitride semiconductor device is provided, including a substrate having a first surface and a second surface opposite to each other; a nucleation layer disposed on the first surface of the substrate; a doped nitride semiconductor layer disposed on the nucleation layer; a doped first buffer layer disposed on the doped nitride semiconductor layer; a channel layer disposed on the doped first buffer layer; a barrier layer disposed on the channel layer; a first electrode disposed on the barrier layer; a second electrode electrically connected to the doped nitride semiconductor layer; and a doped region disposed at least in a portion of the doped nitride semiconductor layer, wherein the doped region is extended from below the first electrode to be partially overlapped with the second electrode.
A nitride semiconductor device, comprising:
A nitride semiconductor device, comprising:
A nitride semiconductor device, comprising:
Dependencies are inferred from the claim text.