Display device and fabrication method thereof

A display device, comprising:

• a substrate that includes a display region and a non-display region that surrounds the display region;
• a plurality of pixels disposed on the display region of the substrate;
• a plurality of dam members disposed on the non-display region of the substrate that surround the display region;
• a first encapsulation layer disposed on the substrate that covers the plurality of pixels and the plurality of dam members;
• and
• a second encapsulation layer disposed on the first encapsulation layer and in a region between the display region and a dam member of the plurality of dam members that is adjacent to the display region,
• wherein the first encapsulation layer comprises silicon oxynitride,
• the second encapsulation layer comprises silicon oxynitride or silicon oxide, and
• the first and second inorganic materials differ from each other in terms of composition ratios of silicon, oxygen, and nitrogen.

A method of fabricating a display device, comprising:

• preparing a substrate that includes a display region and a non-display region that surrounds the display region;
• forming a plurality of pixels on the display region of the substrate;
• forming a plurality of dam members on the non-display region of the substrate that surround the display region;
• forming a first encapsulation layer on the substrate that covers the pixels and the dam members;
• and
• forming a second encapsulation layer on the first encapsulation layer and in a region between the display region and a dam member of the plurality of dam members that is adjacent to the display region,
• wherein the second encapsulation layer has a top surface whose surface roughness is greater than a surface roughness of a top surface of the first encapsulation layer.