Method of manufacturing display device including multilayered lines arranged at fine intervals
AssigneeSamsung Display Co., Ltd.
InventorsIn Kyung Yoo, Chong Sup Chang, Dong Hyun Yang
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Abstract
A method of manufacturing a display device, includes providing a substrate including a first stepped part, forming a metal layer on the substrate and the first stepped part, forming an organic layer pattern on the metal layer at a position corresponding to a sidewall of the stepped part, forming a photosensitive layer on the metal layer and the organic layer pattern, patterning the photosensitive layer to form a photosensitive layer pattern adjacent to the organic layer pattern, and forming a metal line by removing the organic layer pattern and an exposed portion of the metal layer through an etching process using the photosensitive layer pattern as a mask.
Claims20
A method of manufacturing a display device, comprising:
- providing a substrate including a first stepped part;
- forming a metal layer on the substrate and the first stepped part;
- forming an organic layer pattern on the metal layer at a position corresponding to a sidewall of the first stepped part;
- forming a photosensitive layer on the metal layer and the organic layer pattern;
- patterning the photosensitive layer to form a photosensitive layer pattern adjacent to the organic layer pattern;
- and
- forming a metal line by removing the organic layer pattern and an exposed portion of the metal layer through an etching process using the photosensitive layer pattern as a mask.
A method of manufacturing a display device, comprising:
- providing a substrate;
- forming a plurality of patterns on the substrate such that a plurality of steps is formed on a surface of the substrate, wherein each of the patterns is spaced apart from each other by a predetermined distance;
- forming a metal layer on the substrate and the plurality of patterns;
- forming a plurality of organic layer patterns on the metal layer at positions corresponding to sidewalls of the plurality of patterns;
- forming a photosensitive layer on the metal layer and the plurality of organic layer patterns;
- patterning the photosensitive layer to form a photosensitive layer pattern between the plurality of organic layer patterns;
- and
- forming a plurality of metal lines by removing the organic layer patterns and exposed portions of the metal layer through an etching process using the photosensitive layer pattern as a mask.
A method of manufacturing a display device, comprising:
- providing a substrate including a plurality of stepped parts, wherein each stepped part includes sidewalls that are slanted;
- forming a first insulating layer on the substrate and the plurality of stepped parts;
- forming a metal layer on the first insulating layer;
- forming an organic layer pattern on the metal layer, wherein the organic layer pattern overlaps the sidewalls of the plurality of stepped parts that are slanted;
- forming a photosensitive layer on the metal layer;
- patterning the photosensitive layer to form a photosensitive layer pattern and to expose a portion of the metal layer;
- and
- forming a metal line by removing the organic layer pattern and the exposed portion of the metal layer.
Dependencies are inferred from the claim text.