Removal method and processing method

A removal method for selectively removing a plurality of types of metal oxide films in a plurality of recesses formed in a substrate that is arranged in a processing chamber, the removal method comprising process steps of:

• exposing the plurality of types of metal oxide films to BCl3 gas or a BCl3 gas plasma generated by introducing BCl3 gas;
• stopping introduction of the BCl3 gas and performing a purge process;
• exposing the plurality of types of metal oxide films and/or a plurality of types of metal films underneath the metal oxide films to a plasma generated by introducing an inert gas;
• and
• stopping introduction of the inert gas and performing the purge process;
• wherein the process steps are repeated a plurality of times;
• and
• wherein the process step of exposing the plurality of types of metal oxide films and/or the plurality of types of metal films underneath the metal oxide films to the plasma includes
• exposing the plurality of types of metal oxide films and/or the plurality of types of metal films underneath the metal oxide films to one or more different plasmas generated from a single gas.