Excimer laser annealing apparatus

An excimer laser annealing apparatus for laser annealing a substrate, comprising a beam current consumer, a focusing lens, and a laser, wherein the beam current consumer is disposed between the substrate and the laser, the focusing lens is disposed between the beam current consumer and the laser and is located on an optical path of the laser beam of the laser directed onto the substrate, a focus of the focusing lens is on the optical path of the laser beam of the laser directed onto the substrate and on the substrate, the beam current consumer is provided with a transmission cavity running through the beam current consumer and a reflection cavity connecting with the transmission cavity, the reflection cavity comprises a surface provided with a reflection film, the surface faces the substrate, the laser beam generated by the laser is focused by the focusing lens and then emitted to the substrate through the transmission cavity, the substrate reflects the focused laser beam onto the reflective film and is reflected back to the substrate via the reflective film.