Substrate processing device
AssigneeSCREEN Holdings Co., Ltd.
InventorsMotoyuki SHIMAI, Toyohide HAYASHI, Akito HATANO
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AssigneeSCREEN Holdings Co., Ltd.
InventorsMotoyuki SHIMAI, Toyohide HAYASHI, Akito HATANO
Estimating the term…
A substrate processing device is provided with: a spin base disposed below a substrate grasped by a plurality of chuck members, the spin base transmitting the drive force of a spin motor to the chuck members; and a nozzle for supplying a processing fluid for processing the substrate to the top surface and/or bottom surface of the substrate. An IH heating mechanism of the substrate processing device has: a heat-generating member disposed between the substrate and the spin base; a heating coil disposed below the spin base; and an IH circuit for supplying electric power to the heating coil, whereby an alternating magnetic field applied to the heat-generating member is generated, and the heat-generating member is caused to generate heat.
A substrate processing apparatus comprising:
Dependencies are inferred from the claim text.