US 2019/0198356 A1Published application

Substrate processing device

AssigneeSCREEN Holdings Co., Ltd.

InventorAyumi HIGUCHI

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Abstract

An object is to quickly regenerate metal ion removal capability of a substrate processing device. To achieve the object, a substrate processing device includes a processing unit, a supply tank and a collection tank. The processing unit performs etching processing on a substrate by using a treatment solution from a first circulation path. The used treatment solution is guided to the collection tank, and circulates in a second circulation path. The second circulation path includes a first partial pipe and a second partial pipe, and a metal removal coating including metal capturing groups for removing metal ions in the treatment solution is applied to an inner wall of the first partial pipe. An acid-based chemical solution is supplied to the first partial pipe from the acid-based chemical solution supply unit, so that metal adsorption force of the metal capturing groups is regenerated.

Claims6

Dependent claims

A substrate processing device comprising:

a supply tank which stores a treatment solution;
a processing unit which supplies the treatment solution in said supply tank to a substrate and performs etching processing on the substrate;
a collection path which guides to a collection tank the treatment solution supplied for said etching processing;
a treatment solution circulation path which goes from said collection tank and returns to said collection tank;
and
a pump which circulates the treatment solution in said collection tank via said treatment solution circulation path, wherein
a coating is applied to an inner wall of a pipe, the coating including a metal capturing group which removes a metal ion in said treatment solution, and the inner wall being at least part of said treatment solution circulation path,
the substrate processing device further comprising an acid-based chemical solution supply unit which supplies an acid-based chemical solution to said pipe to which said coating has been applied, and removes the metal ion from said metal capturing group.

5 more elements

Dependencies are inferred from the claim text.