Substrate processing method

A substrate processing method using a substrate processing apparatus including a plurality of processing chambers for processing a substrate, the substrate processing method comprising:

• referring to a memory unit in which an estimated model of sensor data generated from sensor data input to or output from each of the processing chamber when processing first test substrates are processed in the processing chambers under a same processing condition;
• adjusting an apparatus parameter of each of the processing chambers such that a deviation of the input or output sensor data from an ideal sensor value is within an allowable range;
• loading product substrates continuously into the processing chambers without specifying a loading destination processing chamber;
• and
• when the product substrate is loaded into a processing chamber of the processing chambers in the loading,
• adjusting the sensor data input to or output from the processing chamber into which the product substrate has been loaded based on the apparatus parameter of the processing chamber that has been adjusted in the adjusting;
• and
• processing the product substrate.