Multiple charged particle beam writing method, and multiple charged particle beam writing apparatus

A multiple charged particle beam writing apparatus comprising:

• a stage configured to be movable and to mount thereon a target object;
• an emission source configured to emit a charged particle beam;
• a shaping aperture array substrate, in which a plurality of openings are formed, configured to form and shape multiple beams by letting portions of the charged particle beam individually pass through a corresponding one of the plurality of openings;
• a first deflector configured to perform a tracking operation by shifting a main deflection position of the multiple beams in a direction of movement of the stage so that the main deflection position of the multiple beams follows the movement of the stage;
• a second deflector configured to shift a sub deflection position of the multiple beams during the tracking operation;
• and
• a deflection control circuit configured to control the first deflector and the second deflector so that, during the tracking operation, each beam of the multiple beams straddles rectangular regions in a plurality of rectangular regions obtained by dividing a writing region of the target object into meshes by a size of a pitch between beams of the multiple beams, and the each beam is applied to a different position in each of the rectangular regions straddled, and so that a predetermined number of shots per beam using a plurality of beams in the multiple beams are applied to each of the plurality of rectangular regions.