Ion Beam Quality Control Using A Movable Mass Resolving Device

A method of tuning a ribbon ion beam using an ion implantation system comprising:

• using a controller to configure a quadrupole lens and a mass analyzer to set a crossover point at an initial value in an X direction and a Z direction, wherein the crossover point is defined as a point at which ions of a desired species cross after exiting the mass analyzer;
• moving a mass resolving device so that a center of a resolving aperture is aligned with the crossover point;
• analyzing characteristics of the ribbon ion beam to create a figure of merit;
• and if the figure of merit is outside a predetermined limit:
• selecting a new value of the crossover point in the X direction;
• configuring the quadrupole lens and the mass analyzer to set the crossover point at the new value;
• moving the mass resolving device so that the center of the resolving aperture is aligned with the crossover point;
• and
• repeating the analyzing at the new value in the X direction.

A beam line ion implantation system to create a ribbon ion beam, comprising:

• an ion source;
• a mass analyzer, wherein ions of a desired species exit the mass analyzer along a central trajectory;
• a mass resolving device, disposed downstream from the mass analyzer and having a resolving aperture, wherein a center of the resolving aperture may be moved in at least one direction;
• and
• a collimator disposed downstream from the mass resolving device.