Multiple charged particle beam writing apparatus, and multiple charged particle beam writing method

A multiple charged particle beam writing apparatus comprising:

• a storage device configured to store writing data defining pattern data on a figure pattern to be written;
• a stage configured to be movable and to mount thereon a target object;
• an emission source configured to emit a charged particle beam;
• a shaping aperture array substrate, in which a plurality of openings are formed, configured to be rotatable and to form and shape multiple beams by letting portions of the charged particle beam individually pass through a corresponding one of the plurality of openings;
• a data rotation correction circuitry configured to read the writing data from the storage device, and, by using information on a rotational deviation amount of an aperture array image of the multiple beams on the target object caused by a residual error of rotation adjustment of the shaping aperture array substrate, to generate pattern data in which a whole of the figure pattern has been rotated in a reverse direction to a rotational deviation direction of the aperture array image by the rotational deviation amount of the aperture array image;
• a blanking aperture array mechanism configured to provide individual blanking control of the multiple beams, based on the pattern data of the figure pattern having been rotated in the reverse direction, and to be rotatable with the shaping aperture array substrate;
• and
• a deflector configured to deflect the multiple beams which have passed through the blanking aperture array mechanism and whose aperture array image has a rotational deviation caused by the residual error of the rotation adjustment of the shaping aperture array substrate, to desired positions on the target object.