Metallic Ion Source

2:

• The metallic ion source according to claim 1, further comprising:
• an exhaustion resistance between the dual evaporation-plasma chamber and the electron beam generation chamber;
• and
• a differential exhaustion structure for, when the dual evaporation-plasma chamber interior is elevated by the precursor gas to a predetermined gas pressure, maintaining the vacuum level of the electron beam generation chamber at a high vacuum of not greater than 1×10−2 Pa.

4:

• The metallic ion source according to claim 1, further comprising:
• an ion extraction chamber, connected to the dual evaporation-plasma chamber;
• an ion extraction port, through which diffused plasma is introduced into the ion extraction chamber, provided in the dual evaporation-plasma chamber;
• an ion extraction electrode system provided in the ion extraction chamber, adjacent to the ion extraction port;
• an exhaustion resistance between the dual evaporation-plasma chamber and the ion extraction chamber;
• and
• a differential exhaustion structure for, when the dual evaporation-plasma chamber interior is elevated by the precursor gas to a predetermined gas pressure, maintaining the vacuum level at the ion extraction electrode system at a high vacuum of not greater than 1×10−2 Pa.

6:

• The metallic ion source according to claim 2, further comprising:
• an ion extraction chamber, connected to the dual evaporation-plasma chamber;
• an ion extraction port, through which diffused plasma is introduced into the ion extraction chamber, provided in the dual evaporation-plasma chamber;
• an ion extraction electrode system provided in the ion extraction chamber, adjacent to the ion extraction port;
• and
• a differential exhaustion structure for, when the dual evaporation-plasma chamber interior is elevated by the precursor gas to a predetermined gas pressure, maintaining the vacuum level at the ion extraction electrode system at a high vacuum of not greater than 1×10−2 Pa.

7:

• The metallic ion source according to claim 3, further comprising:
• an ion extraction chamber, connected to the dual evaporation-plasma chamber;
• an ion extraction port, through which diffused plasma is introduced into the ion extraction chamber, provided in the dual evaporation-plasma chamber;
• an ion extraction electrode system provided in the ion extraction chamber, adjacent to the ion extraction port;
• an exhaustion resistance between the dual evaporation-plasma chamber and the ion extraction chamber;
• and
• a differential exhaustion structure for, when the dual evaporation-plasma chamber interior is elevated by the precursor gas to a predetermined gas pressure, maintaining the vacuum level at the ion extraction electrode system at a high vacuum of not greater than 1×10−2 Pa.

8:

• The metallic ion source according to claim 5, further comprising:
• an ion extraction chamber, connected to the dual evaporation-plasma chamber;
• an ion extraction port, through which diffused plasma is introduced into the ion extraction chamber, provided in the dual evaporation-plasma chamber;
• an ion extraction electrode system provided in the ion extraction chamber, adjacent to the ion extraction port;
• and
• a differential exhaustion structure for, when the dual evaporation-plasma chamber interior is elevated by the precursor gas to a predetermined gas pressure, maintaining the vacuum level at the ion extraction electrode system at a high vacuum of not greater than 1×10−2 Pa.