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US 2019/0198243 A1Published application
Magnetic material stack and magnetic inductor structure fabricated with surface roughness control
AssigneeInternational Business Machines Corporation
InventorsHariklia Deligianni, Bruce B. Doris, Eugene J. O'Sullivan, Naigang Wang
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Abstract
A magnetic material stack comprises a first dielectric layer, a first magnetic material layer on the first dielectric layer, at least a second dielectric layer on the first magnetic material layer and at least a second magnetic material layer on the second dielectric layer. One or more surfaces of the layers are smoothed to remove at least a portion of surface roughness on the respective layers
Claims20
A magnetic material stack, comprising:
- a first dielectric layer;
- a first magnetic material layer on the first dielectric layer;
- at least a second dielectric layer on the first magnetic material layer;
- and
- at least a second magnetic material layer on the second dielectric layer.
2 more elements
A magnetic inductor structure, comprising:
- a substrate;
- a magnetic material stack formed on the substrate, the magnetic material stack comprising:
- a first dielectric layer;
- a first magnetic material layer on the first dielectric layer;
- at least a second dielectric layer on the first magnetic material layer;
- and
- at least a second magnetic material layer on the second dielectric layer;
- and
- one or more conductive windings positioned around the magnetic material stack.
6 more elements
Dependencies are inferred from the claim text.