Back to results
US 2019/0196344 A1Published application
Vacuum system, in particular euv lithography system, and optical element
AssigneeCarl Zeiss SMT GmbH
InventorsMatthias ROOS, Eugen FOCA
Life of this patent
Estimating the term…
Abstract
A vacuum system, in particular an EUV lithography system, includes: a vacuum housing (2), in which a vacuum environment (16) is formed. A surface (2a) of the vacuum housing is subjected to contaminating particles (17) in the vacuum environment. A surface structure (18) at the surface reduces adhesion of the contaminating particles and has pore-shaped depressions (24) separated from one another by webs (25).
Claims10
A vacuum system, comprising:
- a vacuum housing, in which a vacuum environment is formed, wherein a surface of the vacuum housing is subjected to contaminating particles in the vacuum environment,
- wherein a surface structure at the surface reduces adhesion of the contaminating particles, and wherein the surface structure has pore-shaped depressions separated from one another by webs.
Dependencies are inferred from the claim text.