Lithographic apparatus and device manufacturing method
AssigneeASML Netherlands B.V.
InventorsKoen Jacobus Johannes Maria ZAAL, Joost Jeroen OTTENS
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Abstract
A lithographic apparatus with a cover plate formed separately from a substrate table and means for stabilizing a temperature of the substrate table by controlling the temperature of the cover plate is disclosed. A lithographic apparatus with thermal insulation provided between a cover plate and a substrate table so that the cover plate acts as a thermal shield for the substrate table is disclosed. A lithographic apparatus comprising means to determine a substrate table distortion and improve position control of a substrate by reference to the substrate table distortion is disclosed.
Claims18
A lithographic apparatus, comprising:
- a substrate table arranged to support a substrate;
- a projection system configured to project a modulated radiation beam onto a substrate;
- a liquid supply system configured to provide a liquid in a region between the projection system and a substrate during exposure;
- a cover plate, physically separate from the substrate table, positioned radially outside of the substrate during exposure, and configured to provide a surface facing the projection system that is substantially adjacent to and level with the substrate;
- and
- a substrate table temperature stabilization device configured to reduce a temperature deviation of a part of the substrate table from a corresponding target temperature by controlling a temperature of a part of the cover plate.
A lithographic apparatus, comprising:
- a substrate table arranged to support a substrate;
- a projection system configured to project a modulated radiation beam onto a substrate;
- a liquid supply system configured to provide a liquid in a region between the projection system and a substrate during exposure;
- a cover plate, physically separate from the substrate table, positioned radially outside of the substrate during exposure, and configured to provide a surface facing the projection system that is substantially adjacent to and level with the substrate;
- and
- a thermal insulator arranged to reduce heat transfer between the cover plate and the substrate table in order to provide thermal shielding of the substrate table by the cover plate.
A lithographic apparatus, comprising:
- a substrate table arranged to support a substrate;
- a projection system configured to project a modulated radiation beam onto a substrate;
- a measuring system configured to determine a position of a portion of the substrate table;
- a substrate table distortion determining device arranged to provide data regarding a distortion of the substrate table;
- and
- a substrate position controller configured to control the position of the substrate relative to the projection system by reference to the position of a portion of the substrate table measured by the measuring system and data regarding a distortion of the substrate table provided by the substrate table distortion determining device.
Dependencies are inferred from the claim text.