Optical system, lithography apparatus and method
AssigneeCarl Zeiss SMT GmbH
InventorJoachim Hartjes
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Abstract
An optical system for a lithography apparatus, having a first component, a second component, and an optical element, which is held between the first component and the second component with force-fit engagement and for this purpose is subjected to a clamping force. At least one of the components includes a bearing portion which contacts the optical element and which has a shape-memory alloy.
Claims20
An optical system, comprising:
- a first component comprising a bearing portion which comprises a shape-memory alloy;
- a second component;
- and
- an optical element is force between the first and second components via a clamping force,
- wherein the bearing portion contacts the optical element, and the optical system is a lithography optical system.
A method of making an optical system for a lithography apparatus comprising an optical element between first and second components, the first component comprising a bearing portion contacting the optical element, the bearing portion comprising a shape-memory alloy, the method comprising:
- a) subjecting at least one member selected from the group consisting of the first component and the second component to a clamping force to force-fit the optical element between the first and second components;
- and
- b) after a), pseudo-elastically deforming the bearing portion.
Dependencies are inferred from the claim text.