Method and system to monitor a process apparatus
AssigneeASML Netherlands B.V.
InventorsWim Tjibbo TEL, Mark John MASLOW, Frank STAALS, Paul Christiaan HINNEN
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Abstract
A method involving determining a contribution that one or more process apparatuses make to a characteristic of a substrate after the substrate has been processed according to a patterning process by the one or more process apparatuses by removing from values of the characteristic of the substrate a contribution of a lithography apparatus to the characteristic and a contribution of one or more pre-lithography process apparatuses to the characteristic.
Claims20
A method, comprising:
- determining, by a hardware computer system, a contribution that one or more process apparatuses make to a characteristic of a substrate after the substrate has been processed according to a patterning process by the one or more process apparatuses by removing from values of the characteristic of the substrate a contribution of a lithography apparatus to the characteristic and a contribution of one or more pre-lithography process apparatuses to the characteristic.
A method, comprising:
- estimating, by a hardware computer system, a characteristic that will be imparted to a substrate to be processed by a pattering process by combining a contribution specific to the substrate of a first group of one or more process variables related to one or more process apparatuses used in the patterning process and a contribution non-specific to the substrate of a second group of one or more process variables related to the one or more process apparatuses, at least one process variable from the first group and/or the second group being related to a process apparatus upstream from a lithographic apparatus.
A non-transitory computer program product comprising machine-readable instructions, that when executed by a computer system, are configured to cause the computer system to at least determine a contribution that one or more process apparatuses make to a characteristic of a substrate after the substrate has been processed according to a patterning process by the one or more process apparatuses by removing from values of the characteristic of the substrate a contribution of a lithography apparatus to the characteristic and a contribution of one or more pre-lithography process apparatuses to the characteristic.
A method, comprising:
- determining one or more contributions of one or more first process apparatuses to a characteristic of a substrate;
- and
- creating, by a computer hardware system and based at least in part on the one or more contributions, modification information to adjust one or more second process apparatuses downstream from the one or more first process apparatuses.
Dependencies are inferred from the claim text.