Resist underlayer composition, and method of forming patterns using the composition

A resist underlayer composition, comprising:

• a solvent;
• and
• a polymer having a structure where:
• at least one of a first moiety represented by one of Chemical Formula 1-1 to Chemical Formula 1-3 is combined with a third moiety represented by Chemical Formula 3, or
• at least one of a second moiety represented by one of Chemical Formula 2-1 to Chemical Formula 2-3 is combined with a third moiety represented by Chemical Formula 3,
• wherein, in Chemical Formulae 1-1 to 1-3 and Chemical Formulae 2-1 to 2-3,
• R1 to R4 are independently hydrogen, deuterium, a halogen, a hydroxy group, a cyano group, a nitro group, an amino group, an epoxy group, a vinyl group, a (meth)acrylate group, an oxetane group, a thiol group, a carboxyl group, a substituted or unsubstituted C1 to C30 alkyl group, a substituted or unsubstituted C2 to C30 alkenyl group, a substituted or unsubstituted C2 to C30 alkynyl group, a substituted or unsubstituted C1 to C10 alkoxy group, a substituted or unsubstituted C1 to C30 thioalkyl group, a substituted or unsubstituted C3 to C30 cycloalkyl group, a substituted or unsubstituted C6 to C30 aryl group, a substituted or unsubstituted C6 to C30 aryloxy group, a substituted or unsubstituted C6 to C30 thioaryl group, a substituted or unsubstituted C2 to C30 heteroaryl group, or a combination thereof, and
• each*of Chemical Formulae 1-1 to Chemical Formulae 2-3 is a linking point,
• wherein, in Chemical Formula 3,
• A is a single bond, a substituted or unsubstituted C1 to C10 alkylene group, —C(═O)—, —(CO)O—, —O(CO)O—, or a combination thereof,
• X is a single bond, —O—, —S—, —S(═O)—, —S(═O)—, —S(—O)2, —C(═O)—, —(CO)O—, —O(CO)O—, —NR—, in which R′ is hydrogen, deuterium, or a C1 to C10 alkyl group, or a combination thereof,
• R5 is hydrogen, deuterium, a halogen, a hydroxy group, a cyano group, a nitro group, an amino group, an epoxy group, a vinyl group, a (meth)acrylate group, an oxetane group, a thiol group, a carboxyl group or a salt thereof, a sulfonic acid group or a salt thereof, a phosphoric acid group or a salt thereof, a substituted or unsubstituted C1 to C30 alkyl group, a substituted or unsubstituted C2 to 00 alkenyl group, a substituted or unsubstituted C2 to C30 alkynyl group, a substituted or unsubstituted C1 to C10 alkoxy group, a substituted or unsubstituted C3 to C10 cycloalkyl group, a substituted or unsubstituted C1 to C30 thioalkyl group, a substituted or unsubstituted C6 to C30 aryl group, a substituted or unsubstituted C2 to C30 heteroaryl group, a substituted or unsubstituted C6 to C30 aryloxy group, a substituted or unsubstituted C6 to C30 thioaryl group, or a combination thereof,
• R6 is hydrogen, deuterium, a substituted or unsubstituted C1 to C30 alkyl group, or a substituted or unsubstituted C6 to C30 aryl group,
• n1 is an integer of 1 to 10,000, and
• * is a linking point with * of Chemical Formula 1-1 to Chemical Formula 2-3.