Pattern forming method, method for manufacturing electronic device, and actinic ray-sensitive or radiation-sensitive composition

A pattern forming method comprising the following steps i), ii), and iii):

• i) forming an actinic ray-sensitive or radiation-sensitive film having a film thickness of more than 9 um and 20 um or less, using an actinic ray-sensitive or radiation-sensitive composition including a solvent (S) satisfying the following conditions (a) to (c):
• (a) A>-0.026*B+5
• (b) 0.9<A<2.5
• (c) 120<B<160,
• where A represents a viscosity of the solvent (S), the unit of the viscosity is mPa·s, B represents a boiling point of the solvent (S), and the unit of the boiling point is ° C.,
• in which in a case where the solvent (S) is formed of only one kind of solvent, A represents a viscosity of the solvent (S), the unit of the viscosity is mPa·s, B represents a boiling point of the solvent (S), and the unit of the boiling point is ° C.,
• in a case where the solvent (S) is a mixed solvent formed of two kinds of solvents, A is calculated by Formula (al) and B is calculated by Formula (1)1):
• A=μ1̂X1*μ2̂X2 (a1)
• B=T1*X1+T2*X2 (b1),
• where μ1 represents a viscosity of a first kind of the solvent, the unit of the viscosity is mPa·s, T1 represents a boiling point of the first kind of the solvent, the unit of the boiling point is ° C., and X1 represents a mass proportion of the first kind of the solvent with respect to the total mass of the mixed solvent, and
• μ2 represents a viscosity of a second kind of the solvent, the unit of the viscosity is mPa·s, T2 represents a boiling point of the second kind of the solvent, the unit of the boiling point is ° C., and X2 represents a mass proportion of the second kind of the solvent with respect to the total mass of the mixed solvent, and
• in a case where the solvent (S) is a mixed solvent formed of n kinds of solvents, A is calculated by Formula (a2) and B is calculated by Formula (b2):
• A=μ1̂X1*μ2̂X2* . . . μn̂Xn (a2)
• B=T1*X1+T2*X2+ . . . Tn*Xn (b2),
• where μ1 represents a viscosity of a first kind of the solvent, the unit of the viscosity is mPa·s, T1 represents a boiling point of the first kind of the solvent, the unit of the boiling point is ° C., and X1 represents a mass proportion of the first kind of the solvent with respect to the total mass of the mixed solvent,
• μ2 represents a viscosity of a second kind of the solvent, the unit of the viscosity is mPa·s, T2 represents a boiling point of the second kind of the solvent, the unit of the boiling point is ° C., and X2 represents a mass proportion of the second kind of the solvent with respect to the total mass of the mixed solvent,
• μn represents a viscosity of an nth kind of the solvent, the unit of the viscosity is mPa·s, Tn represents a boiling point of the nth kind of the solvent, the unit of the boiling point is ° C., and Xn represents a mass proportion of the nth kind of the solvent with respect to the total mass of the mixed solvent, and
• n represents an integer of 3 or more;
• ii) irradiating the actinic ray-sensitive or radiation-sensitive film with actinic rays or radiation;
• and
• iii) developing the actinic ray-sensitive or radiation-sensitive film irradiated with actinic rays or radiation, using a developer.