Back to results
US 2019/0196326 A1Published application
Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method of manufacturing electronic device
AssigneeFUJIFILM Corporation
InventorsMasafumi KOJIMA, Daisuke ASAKAWA, Akiyoshi GOTO, Keita KATO, Keiyu OU
Life of this patent
Estimating the term…
Abstract
An actinic ray-sensitive or radiation-sensitive resin composition contains a compound that generates an acid represented by Formula (I) by irradiation with an actinic ray or radiation, and a resin. The resist film is formed of the actinic ray-sensitive or radiation-sensitive resin composition. In the pattern forming method and the method of manufacturing an electronic device, the actinic ray-sensitive or radiation-sensitive resin composition is used.
Claims10
An actinic ray-sensitive or radiation-sensitive resin composition comprising:
- a compound that generates an acid represented by Formula (I) by irradiation with an actinic ray or radiation;
- and
- a resin,
- in Formula (I),
- R1 represents an organic group having 1 or more carbon atoms,
- R2 represents an organic group having 2 or more carbon atoms,
- Rf represents a fluorine atom or a monovalent organic group including a fluorine atom,
- X represents a divalent electron withdrawing group, and
- n represents 0 or 1.
6 more elements
Dependencies are inferred from the claim text.