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US 2019/0196066 A1Published application
Antireflective film, method of producing antireflective film, and eyeglass type display
AssigneeShin-Etsu Chemical Co., Ltd.
InventorJun HATAKEYAMA
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Abstract
The present invention is an antireflective film, including: a support base, and a pattern composed of a photoresist material formed on the support base, the index at a point closer to the support base. The present invention provides an antireflective film that is able to give antireflection effect to decrease the reflection of light, a method of producing the same, and an eyeglass type display.
Claims20
An antireflective film, comprising:
- a support base, and
- a pattern composed of a photoresist material formed on the support base, the pattern having a larger size and a larger refractive index at a point closer to the support base.
A method of producing an antireflective film, comprising:
- coating a support base with a photoresist material that contains an aromatic group-containing polymer compound and a fluorine-containing polymer compound,
- baking the photoresist material to segregate the fluorine-containing polymer compound at a film surface, and subsequently
- exposing and developing the photoresist material to form a pattern having a larger size and a larger refractive index at a point closer to the support base.
Dependencies are inferred from the claim text.