Susceptor for a chemical vapour deposition reactor

A susceptor for a chemical vapor deposition (CVD) CVD reactor with an insertion opening (3), which is arranged in a bearing surface (2) of the susceptor (1) and into which an insertion section (13) of a positioning element (12) is inserted,

• wherein said positioning element (12) forms positioning flanks (15) with a positioning section (14) that protrudes from the insertion opening (3) in order to fix a position of a substrate (11),
• wherein the insertion opening (3) has sidewalls (5) and a base (4),
• wherein the insertion section (13) comprises contact zones (17′), which abut on the sidewalls (5) of the insertion opening (3),
• wherein the positioning section (14) comprises an underside (16) that faces the base (4) of the insertion opening (3),
• wherein an edge-protruding section (18) of the positioning section (14) protruding from the insertion opening (3) forms the positioning flanks (15) and protrudes over a section (9, 6′) of the bearing surface (2) bordering on an edge of the insertion opening (3), and
• wherein the edge-protruding section (18) protrudes over the section (9, 6) of the bearing surface (2) with a clearance (b) greater than zero such that a free space is formed.

A susceptor (1) for a chemical vapor deposition (CVD) CVD reactor with an insertion opening (3), which is arranged in a bearing surface (2) of the susceptor (1) and into which an insertion section (13) of a positioning element (12) is inserted,

• wherein said positioning element (12) forms positioning flanks (15) with a positioning section (14) that protrudes from the insertion opening (3),
• wherein a storage space for a first substrate (11) extends between multiple positioning elements (12),
• wherein the first substrate (11) and a second substrate (11) abut on the positioning flanks (15) of the positioning element (12),
• wherein the first substrate (11) is suspended above a first base (10) of the storage space extending between the positioning elements (12),
• wherein the insertion opening (3) has sidewalls (5) and a second base (4),
• wherein the insertion section (13) comprises contact zones (17′), which abut on the sidewalls (5) of the insertion opening (3),
• wherein the positioning section (14) comprises an underside (16) that faces the base (4) of the insertion opening (3), and
• wherein edge undergrip sections (26) of the insertion section (13) protruding into the insertion opening (3) form carrying zones (27) for carrying an edge of the first substrate (11).