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US 2019/0194803 A1Published application
Susceptor cleaning method
AssigneeTokyo Electron Limited
InventorHitoshi KATO
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AssigneeTokyo Electron Limited
InventorHitoshi KATO
Estimating the term…
A susceptor cleaning method for cleaning a susceptor in a processing chamber is provided. The susceptor cleaning method includes a pre-coating film forming step of placing the susceptor in the processing chamber and forming a pre-coating film on a surface of the susceptor; a deposited film forming step of placing a substrate on the susceptor having the pre-coating film formed thereon and performing a film forming process in the course of which a deposited film is formed on the susceptor; a crack generating step of generating cracks in the deposited film; a pre-coating film removing step of supplying a pre-coating film removing gas into the processing chamber, causing the pre-coating film removing gas to reach the pre-coating film through the cracks, and removing the pre-coating film; and a deposited film removing step of removing the deposited film.
A susceptor cleaning method for cleaning a susceptor in a processing chamber, the susceptor cleaning method comprising:
Dependencies are inferred from the claim text.