Method for fabricating broadband near infrared plasmonic waveguide
AssigneeKorea Institute of Science and Technology
InventorsSeok Joon KWON, Hyoung Uk KIM, IL KI HAN, KWAN IL LEE, Seonju YEO
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Abstract
In a method for fabricating a broadband near infrared plasmonic waveguide, the method includes forming a first pattern on a substrate. A metal thin film is evaporated on the substrate on which the first pattern is formed. The first pattern is removed from the substrate on which the metal thin film is evaporated, to remain a second pattern on the substrate on which the metal thin film is evaporated. The substrate on which the second pattern is formed is heated, to induce dewetting, so that metal nano particles are formed on the substrate.
Claims13
A method for fabricating a broadband near infrared plasmonic waveguide, the method comprises:
- forming a first pattern on a substrate;
- evaporating a metal thin film on the substrate on which the first pattern is formed;
- removing the first pattern from the substrate on which the metal thin film is evaporated, to remain a second pattern on the substrate on which the metal thin film is evaporated;
- and
- heating the substrate on which the second pattern is formed, to induce dewetting, so that metal nano particles are formed on the substrate.
Dependencies are inferred from the claim text.