Deposition of particles at desired locations using plasmonic enhancement

Abstract

Plasmonically enhanced electric fields are used to deposit particles at selected locations through decomposition or electron transfer reactions with precursor molecules in gas or liquid phase. The location of the enhanced electric fields is controlled through a combination of plasmonic substrate structure shape, material, incident light wavelength and polarization. The particles are deposited at designated locations only, whereby no deposition occurs at locations lacking enhanced electric fields. Many reaction variables can be used to change the rate of particle deposition such as precursor molecules, exposure time, precursor concentration, and temperature making for a highly customizable reaction space.

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