# US 2019/0173059 A1 · Display panel, mask, method for manufacturing display panel, and display device > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 2019/0173059 A1 - Document ID: US20190173059A1 - Status: Published application - Kind: A1 - Application number: 16/266,068 - Filed: 2019-02-03 - Published: 2019-06-06 - Earliest claimed: 2018-08-29 - Assignees: Shanghai Tianma Am-Oled Co., Ltd. - Applicants: Shanghai Tianma Am-Oled Co., Ltd. - Inventors: Liyuan LIU; Zhiyong Xiong; Di Zhu; Yawei Zhong - Web page: https://patentgrep.com/patent/US20190173059A1 ## CPC - C23C 14/042: {using masks} - H10K 59/122: Pixel-defining structures or layers, e.g. banks - H10K 71/166: {using selective deposition, e.g. using a mask} - H10K 59/1201: {Manufacture or treatment} - H10K 59/131: Interconnections, e.g. wiring lines or terminals - H10K 71/851: {Division of substrate} - C23C: COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion B21C23/22; covering with metal by connecting pre-existing layers to articles, see the relevant places, e.g. B21D39/00, B23K; metallising of glass C03C; metallising mortars, concrete, artificial stone, ceramics or natural stone C04B41/00; enamelling of, or applying a vitreous layer to, metals C23D; treating metal surfaces or coating of metals by electrolysis or electrophoresis C25D; single-crystal film growth C30B; by metallising textiles D06M11/83; decorating textiles by locally metallising D06Q1/04) - H10K: ORGANIC ELECTRIC SOLID-STATE DEVICES ## Abstract The present invention provides a mask, a display panel, a method for manufacturing a display panel, and a display device. The display panel has a hollow region and a display region surrounding the hollow region. The display panel includes a plurality of organic light-emitting devices arranged only in the display region. Each of the plurality of organic light-emitting devices includes an anode layer, a cathode layer, a light-emitting layer and a functional layer. The functional layer includes a plurality of uneven portions. ## Claims ### Claim 1 A display panel, wherein the display panel has a hollow region and a display region surrounding the hollow region, the display panel comprises: a plurality of organic light-emitting devices, the plurality of organic light-emitting devices being arranged only in the display region rather than in the hollow region, wherein each of the plurality of organic light-emitting devices comprises an anode layer, a cathode layer, a light-emitting layer and a functional layer, and the functional layer comprises a plurality of uneven portions. ### Claim 2 (depends on 1) The display panel according to claim 1, wherein the plurality of uneven portions does not overlap with the light-emitting layer. ### Claim 3 (depends on 2) The display panel according to claim 2, wherein the plurality of the uneven portions comprises a plurality of protrusions and/or plurality of recesses, and the plurality of protrusions and/or the plurality of recesses does not overlap with the light-emitting layer. ### Claim 4 (depends on 3) The display panel according to claim 3, wherein further comprising a pixel definition layer arranged in the display region, wherein the pixel definition layer comprises a plurality of valleys and a plurality of ridges, and the functional layer covers the plurality of valleys and the plurality of ridges of the pixel definition layer, and wherein the light-emitting layer is disposed only at the plurality of valleys of the pixel definition layer, and the plurality of protrusions and the plurality of recesses are disposed only at the plurality of ridges of the pixel definition layer. ### Claim 5 (depends on 3) The display panel according to claim 3, further comprising: a plurality of scan lines and a plurality of data lines arranged in the display region, wherein the plurality of scan lines or the plurality of data lines overlaps with the plurality of protrusions, and the plurality of scan lines or the plurality of data lines overlaps with the plurality of recesses. ### Claim 6 (depends on 2) The display panel according to claim 2, wherein each of the plurality of uneven portions has a width d that satisfies 0.005 μm≤d≤0.35 μm along a direction of a shorter edge of the uneven portion in a plane parallel to the display panel. ### Claim 7 (depends on 1) The display panel according to claim 1, wherein an extension line of the plurality of uneven portions passes through a geometric center of the hollow region, or the extension line of the plurality of uneven portions coincides with an edge of the hollow region. ### Claim 8 (depends on 1) The display panel according to claim 1, wherein the hollow region and an outer contour of the display region are both shaped as closed patterns. ### Claim 9 (depends on 1) The display panel according to claim 1, wherein the functional layer comprises at least one of a buffer layer, an electron injection layer, an electron transport layer, a hole transport layer, or a hole injection layer. ### Claim 10 A method for manufacturing a display panel, comprising: providing a substrate and at least one mask, wherein the substrate has a first region and a second region, a projection of the first region on a plane of the substrate does not overlap with a projection of the second region on the plane of the substrate, the first region and the second region each extend from an edge of the substrate into the substrate, each of the at least one mask comprises an aperture portion and a shielding portion, and the at least one shielding portion extends from an edge of the mask into the mask; and forming a functional layer on a side of the substrate sequentially by vapor deposition through the aperture portion of the at least one mask, wherein the functional layer comprises a first functional portion, a second functional portion, and an uneven portion, and the first functional portion and the second functional portion are respectively located on two sides of the uneven portion, wherein the first functional portion covers the second region, the second functional portion covers the first region, and the first functional portion and the second functional portion are arranged in a same layer. ### Claim 11 (depends on 10) The method according to claim 10, wherein the substrate has a hollow region, and a through hole is provided in the hollow region; and wherein the first functional portion and/or the second functional portion are not formed at the through hole. ### Claim 12 (depends on 11) The method according to claim 11, wherein the at least one mask comprises a first mask and a second mask; the first mask and the second mask each comprise an aperture portion and at least one shielding portion, the at least one shielding portion comprises a first shielding portion and a second shielding portion connected to the first shielding portion; the first shielding portion of the first mask and the first shielding portion of the second mask have a same shape and a same area as the through hole; the second shielding portion of the first mask extends from an edge of the first mask into the first mask, the second shielding portion of the second mask extends from an edge of the second mask into the second mask; the second shielding portion of the first mask has a same shape as the aperture portion of the second mask, and the aperture portion of the first mask has a same shape as the second shielding portion of the second mask; wherein forming the first functional portion and the second functional portion on the side of the substrate sequentially by vapor deposition through the aperture portion of the at least one mask comprises: covering the through hole of the substrate using the first shielding portion of the first mask, covering the first region of the substrate using the second shielding portion of the first mask, and exposing the second region of the substrate from the aperture portion of the first mask; forming the first functional portion on the side of the substrate by vapor deposition through the aperture portion of the first mask; covering the through hole of the substrate using the first shielding portion of the second mask, covering the second region of the substrate using the second shielding portion of the second mask, and exposing the first region of the substrate from the aperture portion of the second mask; and forming the second functional portion on the side of the substrate by vapor deposition through the aperture portion of the second mask. ### Claim 13 (depends on 12) The method according to claim 12, wherein the through hole and an outer contour of the substrate are both shaped as central symmetrical patterns, and a symmetry center of the through hole coincides with a symmetry center of the substrate; wherein said covering the through hole of the substrate using the first shielding portion of the second mask, covering the second region of the substrate using the second shielding portion of the second mask, and exposing the first region of the substrate using the aperture portion of the second mask comprises: adjusting a position of the first mask relative to the substrate in such a manner that the first shielding portion of the first mask covers the through hole of the substrate, the second shielding portion of the first mask covers the second region of the substrate, and the aperture portion of the first mask exposes the first region of the substrate, and wherein said forming the second functional portion on the side of the substrate by vapor deposition through the aperture portion of the second mask comprises: forming the second functional portion on the side of the substrate by vapor deposition through the aperture portion of the first mask having its position adjusted. ### Claim 14 (depends on 13) The method according to claim 13, wherein said adjusting the position of the first mask relative to the substrate comprises: fixing the first mask and rotating the substrate by 180° about the symmetry center of the substrate; or fixing the substrate and rotating the first mask by 180° about the symmetry center of the substrate. ### Claim 15 (depends on 12) The method according to claim 12, wherein the through hole and an outer contour of the substrate are both shaped as circles or equilaterals, and a geometric center of the through hole coincides with a geometric center of the substrate; the second shielding portion of the first mask comprises at least two second shielding sub-portions, and the aperture portion of the first mask comprises at least two aperture sub-portions; a number of the at least two aperture sub-portions is equal to a number of the at least two second shielding sub-portions; the at least two second shielding sub-portions and the at least two aperture sub-portions are alternately arranged; and each of the at least two second shielding sub-portions of the first mask extends from the edge of the first mask into the first mask; the first region of the substrate comprises at least two first sub-regions, and the second region of the substrate comprises at least two second sub-regions; a number of the at least two first sub-regions is equal to a number of the at least two second sub-regions, the number of the at least two first sub-regions is equal to the number of the at least two aperture sub-portions; and the at least two first sub-regions and the at least two second sub-regions are alternately arranged; the first functional portion comprises at least two first function sub-layers, and a number of the at least two first function sub-layers is equal to the number of the at least two aperture sub-portions; the second functional portion comprises at least two second function sub-layers, and a number of the at least two second function sub-layers is equal to the number of the at least two aperture sub-portions; wherein said covering the first region of the substrate using the second shielding portion of the first mask and exposing the second region of the substrate from the aperture portion of the first mask comprises: aligning the at least two second shielding sub-portions of the first mask with the at least two first sub-regions of the substrate in one-to-one correspondence, and aligning the at least two aperture sub-portions of the first mask with the at least two second sub-regions of the substrate in one-to-one correspondence; wherein said forming the first functional portion on the side of the substrate by vapor deposition through the aperture portion of the first mask comprises: forming the at least two first function sub-layers on the side of the substrate by vapor deposition through the at least two aperture sub-portions of the first mask, such that each of the at least two first function sub-layers covers a respective second sub-region of the at least two second sub-regions; wherein said covering the through hole of the substrate using the first shielding portion of the second mask, covering the second region of the substrate using the second shielding portion of the second mask, and exposing the first region of the substrate from the aperture portion of the second mask comprises: adjusting a position of the first mask relative to the substrate in such a manner that the at least two second shielding sub-portions of the first mask are aligned with the at least two second sub-regions of the substrate, and the at least two aperture sub-portions of the first mask are aligned with the at least two first sub-regions of the substrate; wherein said forming the second functional portion on the side of the substrate by vapor deposition through the aperture portion of the second mask comprises: forming the at least two second function sub-layers on the side of the substrate by vapor deposition through the at least two aperture sub-portions of the first mask having its position adjusted, such that each of the at least two second function sub-layers covers a respective first sub-region of the at least two first sub-regions. ### Claim 16 (depends on 12) The method according to claim 12, wherein the through hole and an outer contour of the substrate are both shaped as axisymmetric patterns, and a symmetry axis of the through hole coincides with a symmetry axis of the substrate; wherein said covering the through hole of the substrate using the first shielding portion of the second mask, covering the second region of the substrate using the second shielding portion of the second mask, and exposing the first region of the substrate using the aperture portion of the second mask comprises: fixing the substrate, and rotating the first mask by 180° about the symmetry axis of the substrate or rotating the first mask by 180° about a center point of the symmetry axis of the substrate in a plane of the first mask, such that the first shielding portion of the first mask covers the through hole of the substrate, the second shielding portion of the first mask covers the second region of the substrate, and the aperture portion of the first mask exposes the first region of the substrate; wherein forming the second functional portion on the side of the substrate by vapor deposition through the aperture portion of the second mask comprises: forming the second function layer on the side of the substrate by vapor deposition through the aperture portion of the rotated first mask. ### Claim 17 (depends on 11) The method according to claim 11, wherein the at least one mask comprises a first mask and a second mask; the first mask and the second mask each comprise an aperture portion and a shielding portion, the shielding portion of the first mask has an area larger than that of the through hole, the second mask has a same shape and a same area as the shielding portion of the first mask, the shielding portion of the second mask has a same shape and a same area as the through hole; the shielding portion of the first mask extends from an edge of the first mask into the first mask, and the shielding portion of the second mask extends from an edge of the second mask into the second mask; wherein forming the first functional portion and the second functional portion on the side of the substrate sequentially by vapor deposition through the aperture portion of the at least one mask comprises: covering the through hole of the substrate using the shielding portion of the first mask, and exposing the second region of the substrate from the aperture portion of the first mask; and forming the first functional portion on the side of the substrate by vapor deposition through the aperture portion of the first mask; and aligning the shielding portion of the second mask with the through hole of the substrate, and aligning the aperture portion of the second mask with the first region of the substrate; and forming the second functional portion on the side of the substrate by vapor deposition through the aperture portion of the second mask. ### Claim 18 A mask, comprising an aperture portion and a shielding portion, wherein the shielding portion extends from an edge of the mask into the mask. ### Claim 19 (depends on 18) The mask according to claim 18, wherein the mask comprises a first mask and a second mask; the first mask and the second mask each comprise an aperture portion and at least one shielding portion, and the at least one shielding portion comprises a first shielding portion and a second shielding portion connected to the first shielding portion, the first shielding portion of the first mask has a same shape and a same area as the first shielding portion of the second mask; the second shielding portion of the first mask extends from an edge of the first mask into the first mask, and the second shielding portion of the second mask extends from an edge of the second mask into the second mask; the second shielding portion of the first mask has a same shape and a same area as the aperture portion of the second mask, and the aperture portion of the first mask has a same shape and a same area as the second shielding portion of the second mask. ### Claim 20 (depends on 19) The mask according to claim 19, wherein the first mask, the second mask, the first shielding portion of the first mask, and the first shielding portion of the second mask are all shaped as center symmetrical patterns; and a symmetry center of the first shielding portion of the first mask coincides with a symmetry center of the first mask, and a symmetry center of the first shielding portion of the second mask coincides with a symmetry center of the second mask. ### Claim 21 (depends on 19) The mask according to claim 19, wherein the first mask, the second mask, the first shielding portion of the first mask, and the first shielding portion of the second mask are all shaped as circles or equilaterals; a geometric center of the first shielding portion of the first mask coincides with a geometric center of the first mask, and a geometric center of the first shielding portion of the second mask coincides with a geometric center of the second mask; the second shielding portion of the first mask comprises at least two second shielding sub-portions, and the aperture portion of the first mask comprises at least two aperture sub-portions; a number of the at least two aperture sub-portions is equal to a number of the at least two second shielding sub-portions, the at least two second shielding sub-portions and the at least two aperture sub-portions are alternately arranged, and each of at least two second shielding sub-portions of the first mask extends from the edge of the first mask into the first mask. ### Claim 22 (depends on 19) The mask according to claim 19, wherein the first mask, the second mask, the first shielding portion of the first mask, and the first shielding portion of the second mask are all shaped as axisymmetric patterns; and a symmetry axis of the first shielding portion of the first mask coincides with a symmetry axis of the first mask, and a symmetry axis of the first shielding portion of the second mask coincides with a symmetry axis of the second mask. ### Claim 23 (depends on 18) The mask according to claim 18, wherein the mask comprises a first mask and a second mask, the first mask and the second mask each comprise an aperture portion and a shielding portion, the second mask has a same shape and a same area as the shielding portion of the first mask, the shielding portion of the first mask has an area larger than that of the shielding portion of the second mask, the shielding portion of the first mask extends from an edge of the first mask into the first mask, and the shielding portion of the second mask extends from an edge of the second mask into the second mask. ### Claim 24 (depends on 1) A display device, comprising the display panel according to claim 1.