# US 2019/0172900 A1 · High breakdown voltage passive element

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- Number: US 2019/0172900 A1
- Document ID: US20190172900A1
- Status: Published application
- Kind: A1
- Application number: 16/267,699
- Filed: 2019-02-05
- Published: 2019-06-06
- Earliest claimed: 2015-01-14
- Assignees: Fuji Electric Co., Ltd.
- Applicants: Fuji Electric Co., Ltd.
- Inventors: Masaharu Yamaji
- Web page: https://patentgrep.com/patent/US20190172900A1

## CPC

- H10D 1/20: Inductors
- H10D 1/692: {Electrodes}
- H10W 20/496: {Capacitor integral with wiring layers}
- H10W 20/497: {Inductive arrangements or effects of, or between, wiring layers}
- H10W 40/255: {having a laminate or multilayered structure, e.g. direct bond copper [DBC] ceramic substrates}
- H10W 42/121: {protecting against mechanical damage (H10W76/00, H10W74/00 take precedence)}
- H10D: INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10W: GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10

## Abstract

Warping of a semiconductor wafer occurring due to a difference in the thermal expansion rates of an insulating film and the semiconductor wafer is restricted. Therefore, processing failures and conveying failures in the manufacturing process, as well as cracking of the semiconductor wafer, are restricted. Provided is a high breakdown voltage passive element including a substrate, a lower metal layer and upper metal layer stacked on the substrate, and an insulating unit formed between the lower metal layer and upper metal layer, wherein the insulating unit has a first insulating film whose thermal expansion rate is lower than the thermal expansion rate of the substrate, and a second insulating film, formed on the first insulating film, whose thermal expansion rate is higher than the thermal expansion rate of the substrate.

## Claims

### Claim 1

A high breakdown voltage passive element, comprising:
a substrate;
a metal layer provided in one plane; and
an insulating unit formed between the substrate and the metal layer, the metal layer being disposed on an upper surface side of the insulating unit, the insulating unit having three insulating films including two outer insulating films and an inner insulating film sandwiched by the two outer insulating films, the two outer insulating films having first thermal expansion rates, the inner insulating layer having a second expansion rate, one of the first thermal expansion rates and the second thermal expansion rate being higher that an expansion rate of the substrate, the other of the first expansion rates and the second expansion rate being lower than the expansion rate of the substrate.

### Claim 2 (depends on 1)

The high breakdown voltage passive element according to claim 1, wherein a thickness of an insulating film on an uppermost layer in the insulating unit is greater than a thickness of all other insulating films of the insulating unit.

### Claim 3 (depends on 1)

The high breakdown voltage passive element according to claim 1, wherein the first thermal expansion rates are higher than the thermal expansion rate of the substrate, and the second thermal expansion rate is lower than the thermal expansion rate of the substrate.

### Claim 4 (depends on 1)

The high breakdown voltage passive element according to claim 1, wherein the first thermal expansion rates are lower than the thermal expansion rate of the substrate, and the second thermal expansion rate is higher than the thermal expansion rate of the substrate.