# US 2019/0171120 A1 · Alignment mark recovery method and lithographic apparatus > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 2019/0171120 A1 - Document ID: US20190171120A1 - Status: Published application - Kind: A1 - Application number: 16/323,123 - Filed: 2017-06-30 - Published: 2019-06-06 - Earliest claimed: 2016-08-10 - Assignees: ASML Netherlands B.V. - Applicants: Asml Netherlands B.V. - Inventors: Cayetano SANCHEZ-FABRES COBALEDA; Sanjaysingh LALBAHADOERSING - Web page: https://patentgrep.com/patent/US20190171120A1 ## CPC - G03F 9/7084: {Position of mark on substrate, i.e. position in (x, y, z) of mark, e.g. buried or resist covered mark, mark on rearside, at the substrate edge, in the circuit area, latent image mark, marks in plural levels} - G03F 9/7076: {Mark details, e.g. phase grating mark, temporary mark} - G03F 9/708: {Mark formation} - H10W 46/00: Marks applied to devices, e.g. for alignment or identification - H10W 46/301: {for alignment} - H10W 46/501: {for use before dicing} - G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G) - H10W: GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10 ## Abstract A method for recovering alignment marks in a mark layer of a substrate, the method including providing a substrate with a mark layer covered by a resist layer; forming alignment marks in the mark layer, wherein an alignment mark is formed by: exposing the resist layer to a patterned radiation beam thereby forming an alignment pattern in the resist; forming one or more recovery marks in the mark layer, wherein a recovery mark is formed by exposing the resist layer to at least a portion of the patterned radiation beam thereby forming an alignment pattern in a mark area of the resist and subsequently exposing the mark area of the resist, each time with a shifted patterned radiation beam until a substantial part of the mark area has been exposed. ## Claims ### Claim 1 A method for recovering an alignment mark after the alignment mark is obscured by one or more subsequent process steps, the method comprising: forming one or more alignment marks in a mark layer of a substrate, wherein an alignment mark of the one or more alignment marks is formed by exposing a resist covering the mark layer to a patterned radiation beam thereby forming an alignment pattern in a first mark area of the resist corresponding to the alignment mark; forming one or more recovery marks in the mark layer, wherein a recovery mark of the one or more recovery marks is formed by: exposing the resist to at least a portion of the patterned radiation beam thereby forming an alignment pattern in a second mark area of the resist, and subsequently exposing the second mark area of the resist, each time with a shifted patterned radiation beam until a substantial part of the second mark area has been exposed; after exposure of the first and second mark areas, developing the resist to remove exposed or non-exposed resist portions; adjusting one or more properties of the mark layer at the second mark area where the resist was removed, such that the one or more recovery marks are detectable after the one or more subsequent process steps; and cleaning the mark layer by removing essentially all resist. ### Claim 2 (depends on 1) The method according to claim 1, wherein the alignment pattern is periodic in a direction, and wherein the second mark area is subsequently exposed once with a patterned radiation beam that is shifted half a period in the direction. ### Claim 3 (depends on 1) The method according of claim 1, wherein one or more of the exposures to form the recovery mark are overexposed for a proper overlay with one or more other exposures to form the recovery mark. ### Claim 4 (depends on 1) The method according to claim 1, wherein one or more of the exposures to form the recovery mark are out of focus for a proper overlay with one or more other exposures to form the recovery mark. ### Claim 5 (depends on 1) The method according to claim 1, further comprising: carrying out subsequent process steps; determining the location of at least one recovery mark of the one or more recovery marks; determining the location of at least one alignment mark of the one or more alignment marks from the determined location of the at least one recovery mark; and providing one or more cleanout windows at the determined location of the at least one alignment mark to reveal the at least one alignment mark. ### Claim 6 (depends on 1) The method according to claim 1, wherein the one or more recovery marks are formed by using only a portion of the patterned radiation beam, which portion corresponds to an alignment mark of the one or more alignment marks. ### Claim 7 (depends on 1) The method according to claim 1, wherein the one or more alignment marks are made in one or more complete target portions including one or more dies on the substrate, and wherein the one or more recovery marks are formed outside of the one or more complete target portions. ### Claim 8 (depends on 1) The method according to claim 1, wherein adjusting one or more properties of the mark layer includes etching of the mark layer. ### Claim 9 (depends on 1) The method according to claims 1, wherein adjusting one or more properties of the mark layer includes increasing the layer mark layer thickness by deposition. ### Claim 10 (canceled) ### Claim 11 A lithographic apparatus comprising: a support constructed to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate; and a control system to control operation of the lithographic apparatus, wherein the control system is configured to cause the lithographic apparatus to at least: form one or more alignment marks in a mark layer of the substrate, wherein an alignment mark of the one or more alignment marks is formed by exposing a resist covering the mark layer to the patterned radiation beam thereby forming an alignment pattern in a first mark area of the resist corresponding to the alignment mark; and form one or more recovery marks in the mark layer, wherein a recovery mark of the one or more recovery marks is formed by: exposing the resist to at least a portion of the patterned radiation beam thereby forming an alignment pattern in a second mark area of the resist, and subsequently exposing the second mark area of the resist, each time with a shifted patterned radiation beam until a substantial part of the second mark area has been exposed. ### Claim 12 (depends on 11) The lithographic apparatus according to claim 11, further comprising one or more shielding elements to shield the patterning device to allow only a portion of the patterned radiation beam to be formed, which portion corresponds to an alignment mark for the formation of the recovery marks. ### Claim 13 A computer-readable medium comprising computer readable code therein, the computer readable code, when executed by a computer system, configured to cause the computer system to at least cause: formation of one or more alignment marks in a mark layer of a substrate, wherein an alignment mark of the one or more alignment marks is formed by exposure of a resist covering the mark layer to a patterned radiation beam thereby forming an alignment pattern in a first mark area of the resist corresponding to the alignment mark; and formation of one or more recovery marks in the mark layer, wherein a recovery mark of the one or more recovery marks is formed by: exposure of the resist to at least a portion of the patterned radiation beam thereby forming an alignment pattern in a second mark area of the resist, and one or more subsequent exposures of the second mark area of the resist, each time with a shifted patterned radiation beam until a substantial part of the second mark area has been exposed. ### Claim 14 (depends on 13) The computer-readable medium of claim 13, wherein the alignment pattern is periodic in a direction, and wherein the second mark area is subsequently exposed once with a patterned radiation beam that is shifted half a period in the direction. ### Claim 15 (depends on 13) The computer-readable medium of claim 13, wherein one or more of the exposures to form the recovery mark are overexposed for a proper overlay with one or more other exposures to form the recovery mark. ### Claim 16 (depends on 13) The computer-readable medium of claim 13, wherein one or more of the exposures to form the recovery mark are out of focus for a proper overlay with one or more other exposures to form the recovery mark. ### Claim 17 (depends on 13) The computer-readable medium of claim 13, wherein the one or more recovery marks are formed by using only a portion of the patterned radiation beam, which portion corresponds to an alignment mark of the one or more alignment marks. ### Claim 18 (depends on 13) The computer-readable medium of claim 13, wherein the one or more alignment marks are made in one or more complete target portions including one or more dies on the substrate, and wherein the one or more recovery marks are formed outside of the one or more complete target portions. ### Claim 19 (depends on 13) The computer-readable medium of claim 13, wherein the instructions are further configured to cause the computer system to: after process steps having been carried on the substrate having the one or more recovery marks, determine the location of at least one recovery mark of the one or more recovery marks; determine the location of at least one alignment mark of the one or more alignment marks from the determined location of the at least one recovery mark; and provide one or more cleanout windows at the determined location of the at least one alignment mark to reveal the at least one alignment mark. ### Claim 20 (depends on 13) The computer-readable medium of claim 13, wherein the instructions are further configured to cause the computer system to cause: after exposure of the first and second mark areas, development of the resist to remove exposed or non-exposed resist portions; adjustment of one or more properties of the mark layer at the second mark area where the resist was removed, such that the one or more recovery marks are detectable after the one or more subsequent process steps; and cleaning of the mark layer by removing essentially all resist. ### Claim 21 (depends on 13) The computer-readable medium of claim 13, wherein adjustment of one or more properties of the mark layer includes etching of the mark layer and/or increase of the layer mark layer thickness by deposition.