# US 2019/0171103 A1 · Photosensitive resin composition, transfer film, protective film for touch panel, touch panel, manufacturing method of the same, and image display apparatus > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 2019/0171103 A1 - Document ID: US20190171103A1 - Status: Published application - Kind: A1 - Application number: 16/268,654 - Filed: 2019-02-06 - Published: 2019-06-06 - Earliest claimed: 2016-08-30 - Assignees: FUJIFILM Corporation - Applicants: FUJIFILM Corporation - Inventors: Tatsuya SHIMOYAMA; Hideyuki NAKAMURA - Web page: https://patentgrep.com/patent/US20190171103A1 ## CPC - G03F 7/033: the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers - G03F 7/031: Organic compounds not covered by group G03F7/029 - G03F 7/038: Macromolecular compounds which are rendered insoluble or differentially wettable (G03F7/075 takes precedence; macromolecular azides G03F7/012; macromolecular diazonium compounds G03F7/021) - G03F 7/16: Coating processes; Apparatus therefor (applying coatings to base materials in general B05; applying photosensitive compositions to base for photographic purposes G03C1/74) - G03F 7/2037: {Exposure with X-ray radiation or corpuscular radiation, through a mask with a pattern opaque to that radiation} - G03F 7/322: {Aqueous alkaline compositions} - G06F 3/041: Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means - G06F 3/0443: {using a single layer of sensing electrodes} - G06F 3/0445: {using two or more layers of sensing electrodes, e.g. using two layers of electrodes separated by a dielectric layer} - G06F 2203/04103: Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices - G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G) - G06F: ELECTRIC DIGITAL DATA PROCESSING (computer systems based on specific computational models G06N) ## Abstract Provided is a photosensitive resin composition including: a photopolymerizable monomer including an ethylenically unsaturated group; a photopolymerization initiator; a polymer including a structural unit having a carboxylic acid anhydride structure; and a nitrogen-containing heterocyclic compound, and application thereof. ## Claims ### Claim 1 A photosensitive resin composition comprising: a photopolymerizable monomer including an ethylenically unsaturated group; a photopolymerization initiator; a polymer including a structural unit having a carboxylic acid anhydride structure; and a nitrogen-containing heterocyclic compound. ### Claim 2 (depends on 1) The photosensitive resin composition according to claim 1, wherein the nitrogen-containing heterocyclic compound is at least one kind of azole compound selected from the group consisting of an imidazole component, a triazole compound, a tetrazole compound, a thiazole compound, and a thiadiazole compound. ### Claim 3 (depends on 1) The photosensitive resin composition according to claim 1, wherein an acid anhydride value of the polymer including the structural unit having the carboxylic acid anhydride structure is 0.80 mmol/g to 5.00 mmol/g. ### Claim 4 (depends on 1) The photosensitive resin composition according to claim 1, wherein the polymer including the structural unit having the carboxylic acid anhydride structure further includes a structural unit derived from a styrene compound. ### Claim 5 (depends on 1) The photosensitive resin composition according to claim 1, wherein the structural unit having the carboxylic acid anhydride structure includes at least one of a structural unit represented by Formula a2-1 and a structural unit represented by Formula a2-2. ### Claim 6 (depends on 1) The photosensitive resin composition according to claim 1, wherein a content of the polymer including the structural unit including the carboxylic acid anhydride with respect to solid contents of the photosensitive resin composition is equal to or smaller than 30% by mass. ### Claim 7 (depends on 1) The photosensitive resin composition according to claim 1, wherein the nitrogen-containing heterocyclic compound includes at least one kind of azole compound selected from the group consisting of an imidazole compound, a triazole compound, and a tetrazole compound. ### Claim 8 (depends on 5) The photosensitive resin composition according to claim 5, wherein the nitrogen-containing heterocyclic compound is at least one kind of azole compound selected from the group consisting of an imidazole component, a triazole compound, and a tetrazole compound, the polymer including the structural unit having the carboxylic acid anhydride structure further includes a structural unit derived from a styrene compound, an acid anhydride value of the polymer including the structural unit having the carboxylic acid anhydride structure is 0.80 mmol/g to 5.00 mmol/g, and a content of the polymer including the structural unit including the carboxylic acid anhydride with respect to solid contents of the photosensitive resin composition is equal to or smaller than 30% by mass. ### Claim 9 (depends on 1) The photosensitive resin composition according to claim 1, which is used for forming a protective film for a touch panel. ### Claim 10 (depends on 8) The photosensitive resin composition according to claim 8, which is used for forming a protective film for a touch panel. ### Claim 11 (depends on 1) A transfer film comprising: a temporary support; and a photosensitive layer including solid contents of the photosensitive resin composition according to claim 1. ### Claim 12 (depends on 11) The transfer film according to claim 11, wherein a thickness of the photosensitive layer is equal to or smaller than 20 μm. ### Claim 13 (depends on 12) The transfer film according to claim 12, which is used for forming a protective film for a touch panel. ### Claim 14 (depends on 9) A protective film for a touch panel which is a cured product of solid contents of the photosensitive resin composition according to claim 9. ### Claim 15 (depends on 10) A protective film for a touch panel which is a cured product of solid contents of the photosensitive resin composition according to claim 10. ### Claim 16 (depends on 14) A touch panel comprising: the protective film for a touch panel according to claim 14. ### Claim 17 (depends on 15) A touch panel comprising: the protective film for a touch panel according to claim 15. ### Claim 18 (depends on 16) An image display apparatus comprising: the touch panel according to claim 16. ### Claim 19 (depends on 9) A manufacturing method of a touch panel comprising: a step of preparing a substrate for a touch panel including a structure in which at least one of an electrode for a touch panel or a wiring for a touch panel is disposed on the substrate; a step of forming a photosensitive layer on a surface of the substrate for a touch panel on a side where at least one of the electrode for a touch panel or the wiring for a touch panel is disposed, by using the photosensitive resin composition according to claim 9; a step of performing pattern-exposing on the photosensitive layer formed on the surface of the substrate for a touch panel; and a step of developing the pattern-exposed photosensitive layer to obtain a protective film for a touch panel which protects at least a part of at least one of the electrode for a touch panel or the wiring for a touch panel. ### Claim 20 (depends on 10) A manufacturing method of a touch panel comprising: a step of preparing a substrate for a touch panel including a structure in which at least one of an electrode for a touch panel or a wiring for a touch panel is disposed on the substrate; a step of forming a photosensitive layer on a surface of the substrate for a touch panel on a side where at least one of the electrode for a touch panel or the wiring for a touch panel is disposed, by using the photosensitive resin composition according to claim 10; a step of performing pattern-exposing on the photosensitive layer formed on the surface of the substrate for a touch panel; and a step of developing the pattern-exposed photosensitive layer to obtain a protective film for a touch panel which protects at least a part of at least one of the electrode for a touch panel or the wiring for a touch panel.