# US 2019/0169743 A1 · Advanced coating method and materials to prevent hdp-cvd chamber arcing > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 2019/0169743 A1 - Document ID: US20190169743A1 - Status: Published application - Kind: A1 - Application number: 16/268,194 - Filed: 2019-02-05 - Published: 2019-06-06 - Earliest claimed: 2015-12-04 - Assignees: Applied Materials, Inc. - Applicants: Applied Materials, Inc. - Inventors: Lin ZHANG; Xuesong LU; Andrew V. LE; Jang Seok OH - Web page: https://patentgrep.com/patent/US20190169743A1 ## CPC - C23C 16/4558: {Perforated rings} - C23C 16/34: Nitrides {(C23C16/303 takes precedence)} - C23C 16/403: {of aluminium, magnesium or beryllium} - C23C 16/4404: {Coatings or surface treatment on the inside of the reaction chamber or on parts thereof} - C23C 16/45536: {Use of plasma, radiation or electromagnetic fields} - C23C 16/45544: {characterized by the apparatus} - C23C 16/505: using radio frequency discharges - C23C 16/507: using external electrodes, e.g. in tunnel type reactors - H01J 37/3244: {Gas supply means} - H01J 37/32449: {Gas control, e.g. control of the gas flow} - C23C: COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion B21C23/22; covering with metal by connecting pre-existing layers to articles, see the relevant places, e.g. B21D39/00, B23K; metallising of glass C03C; metallising mortars, concrete, artificial stone, ceramics or natural stone C04B41/00; enamelling of, or applying a vitreous layer to, metals C23D; treating metal surfaces or coating of metals by electrolysis or electrophoresis C25D; single-crystal film growth C30B; by metallising textiles D06M11/83; decorating textiles by locally metallising D06Q1/04) - H01J: ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps H01T; electric arc lamps H05B31/00; particle accelerators H05H) ## Abstract Embodiments described herein relate to apparatus and coating methods to reduce chamber arcing, for example, in HDP-CVD, PECVD, PE-ALD and Etch chambers. The apparatus include a ring shaped gas distributor used for in-situ deposition of coating materials, and a process chamber including the same. The ring shaped gas distributor includes a ring shaped body having at least one gas entrance port disposed on a first side thereof and a plurality of gas distribution ports disposed on a first surface of the ring shaped body. The plurality of gas distribution ports are arranged in a plurality of evenly distributed rows. The plurality of gas distribution ports in a first row of the plurality of evenly distributed rows is adapted to direct gas at an exit angle different from an exit angle of the plurality of gas distribution ports in a second row of the plurality of evenly distributed rows. ## Claims ### Claim 1 A process chamber, comprising: a chamber body and a lid assembly defining a volume therein, the lid assembly disposed on the chamber body; a gas inlet positioned to introduce gas into the volume; a substrate support positioned in the volume; and a ring shaped gas distributor positioned in the volume beneath the substrate support, the ring shaped gas distributor comprising: a ring shaped body; and a plurality of gas distribution ports disposed on a first surface of the ring shaped body. ### Claim 2 (depends on 1) The process chamber of claim 1, wherein the ring shaped body comprises aluminum. ### Claim 3 (depends on 1) The process chamber of claim 1, wherein each of the plurality of gas distribution ports of the ring shaped gas distributor has a diameter of between about 0.5 millimeters and about 3 millimeters. ### Claim 4 (depends on 1) The process chamber of claim 1, wherein the plurality of gas distribution ports are disposed in a plurality of evenly distributed rows, the plurality of evenly distributed rows spaced apart by about 1 centimeter to about 3 centimeters. ### Claim 5 (depends on 1) The process chamber of claim 1, wherein the ring shaped body is coupled to the chamber body. ### Claim 6 (depends on 1) The process chamber of claim 1, further comprising at least one gas entrance port, wherein the gas entrance port is disposed on a first side of the ring shaped body. ### Claim 7 A process chamber, comprising: a chamber body and a lid assembly defining a process volume therein, the lid assembly disposed on the chamber body; a gas inlet positioned to introduce gas into the process volume; a substrate support positioned in the process volume; and a ring shaped gas distributor disposed in the process volume beneath the substrate support, the ring shaped gas distributor comprising: a semi-toroidal shaped body having a flat surface and a curved surface defining a volume therein; and a plurality of gas distribution ports disposed on the curved surface of the semi-toroidal shaped body. ### Claim 8 (depends on 7) The process chamber of claim 7, wherein the semi-toroidal shaped body comprises aluminum. ### Claim 9 (depends on 7) The process chamber of claim 7, wherein each of the plurality of gas distribution ports of the ring shaped gas distributor has a diameter of between about 0.5 millimeters and about 3 millimeters. ### Claim 10 (depends on 7) The process chamber of claim 7, wherein the plurality of gas distribution ports are disposed in a plurality of evenly distributed rows, the plurality of evenly distributed rows spaced apart by about 1 centimeter to about 3 centimeters. ### Claim 11 (depends on 7) The process chamber of claim 7, wherein the semi-toroidal shaped body is coupled to the chamber body. ### Claim 12 (depends on 7) The process chamber of claim 7, further comprising at least one gas entrance port, wherein the gas entrance port is disposed on a first side of the semi-toroidal shaped body. ### Claim 13 A method, comprising: flowing a first precursor into a process chamber through a first gas inlet; ionizing the first precursor; flowing a second precursor into the process chamber through a ring shaped body adapted to distribute the second precursor, the second precursor different than the first precursor; ionizing the second precursor; and depositing a seasoning material from the ionized first precursor and the ionized second precursor on an internal surface of the process chamber. ### Claim 14 (depends on 13) The method of claim 13, wherein the first precursor comprises H2O, ozone, or oxygen. ### Claim 15 (depends on 13) The method of claim 13, wherein the first precursor comprises N2 or NH3. ### Claim 16 (depends on 13) The method of claim 13, wherein the second precursor is a metal-containing precursor. ### Claim 17 (depends on 13) The method of claim 13, wherein the second precursor comprises trimethylaluminum or AlCl3. ### Claim 18 (depends on 13) The method of claim 13, wherein the seasoning material is Al2O3. ### Claim 19 (depends on 13) The method of claim 13, wherein the seasoning material is AlN. ### Claim 20 (depends on 13) The method of claim 13, wherein the seasoning material is deposited to a thickness of about 0.1 microns to about 10 microns.