# US 2019/0169740 A1 · Swirled flow chemical vapor deposition

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- Number: US 2019/0169740 A1
- Document ID: US20190169740A1
- Status: Published application
- Kind: A1
- Application number: 16/268,761
- Filed: 2019-02-06
- Published: 2019-06-06
- Earliest claimed: 2016-08-30
- Assignees: ROLLS-ROYCE plc; Rolls-Royce High Temperature Composites Inc.
- Applicants: Rolls-Royce Corporation; Rolls-Royce High Temperature Composites, Inc.
- Inventors: Chong M. Cha; David Liliedahl; Richard W. Kidd; Ross Galligher; Nicholas Doan
- Web page: https://patentgrep.com/patent/US20190169740A1

## CPC

- C23C 16/045: {Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates}
- C23C 16/24: Deposition of silicon only
- C23C 16/4412: {Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps}
- C23C 16/45502: {Flow conditions in reaction chamber}
- C23C 16/45563: {Gas nozzles}
- C23C 16/4584: {the substrate being rotated}
- C23C 16/4588: {the substrate being rotated}
- C23C 16/46: characterised by the method used for heating the substrate (C23C16/48, C23C16/50 take precedence)
- C23C 16/52: Controlling or regulating the coating process {(C23C16/45557, C23C16/279 take precedence)}
- F01D 5/288: {Protective coatings for blades}
- F05D 2230/90: Coating; Surface treatment
- F05D 2300/6033: Ceramic matrix composites [CMC]
- Y02T 50/60: Efficient propulsion technologies, e.g. for aircraft
- C23C: COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion B21C23/22; covering with metal by connecting pre-existing layers to articles, see the relevant places, e.g. B21D39/00, B23K; metallising of glass C03C; metallising mortars, concrete, artificial stone, ceramics or natural stone C04B41/00; enamelling of, or applying a vitreous layer to, metals C23D; treating metal surfaces or coating of metals by electrolysis or electrophoresis C25D; single-crystal film growth C30B; by metallising textiles D06M11/83; decorating textiles by locally metallising D06Q1/04)
- F01D: NON-POSITIVE DISPLACEMENT MACHINES OR ENGINES, e.g. STEAM TURBINES (machines or engines for liquids F03; non-positive displacement pumps F04D)
- F05D: INDEXING SCHEME FOR ASPECTS RELATING TO NON-POSITIVE-DISPLACEMENT MACHINES OR ENGINES, GAS-TURBINES OR JET-PROPULSION PLANTS
- Y02T: CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO TRANSPORTATION

## Abstract

A system may include a reactor vessel comprising an outer wall, a heat source thermally coupled to the reactor vessel, at least one reactor inlet in the outer wall, and at least one reactor outlet. The reactor vessel may be configured to house a porous preform in a radially central core region. The at least one reactor inlet may be configured to introduce a precursor gas to the reactor vessel to produce swirling flow of the precursor gas around the radially central core region of the reactor vessel. The at least one reactor outlet may be configured to remove exhaust gas from the reactor vessel and assist in maintaining a dynamic pressure of the reactor vessel greater than a pressure in the porous preform.

## Claims

### Claim 1

A system comprising:
a reactor vessel comprising an outer wall, wherein the reactor vessel is configured to house a porous preform in a radially central core region;
a heat source thermally coupled to the reactor vessel;
at least one reactor inlet in the outer wall configured to introduce a precursor gas to the reactor vessel to produce swirling flow of the precursor gas around the radially central core region of the reactor vessel; and
at least one reactor outlet configured to remove exhaust gas from the reactor vessel,
wherein at least one of the at least one reactor inlet or the at least one reactor outlet is configured to assist in maintaining a dynamic pressure of the reactor vessel greater than a pressure in the porous preform.

### Claim 2 (depends on 1)

The system of claim 1, wherein the at least one reactor inlet includes a first reactor inlet and a second reactor inlet, and wherein the first reactor inlet and the second reactor inlet are disposed at different axial locations of the outer wall.

### Claim 3 (depends on 1)

The system of claim 1, further comprising a rotating substrate stand configured to rotate the porous preform.

### Claim 4 (depends on 1)

The system of claim 1, wherein the at least one reactor inlet is configured to introduce the precursor gas at a radial angle between 0 and 90 degrees from a tangential surface of the outer wall.

### Claim 5 (depends on 1)

The system of claim 1, wherein the at least one reactor inlet is configured to introduce the precursor gas at an axial angle between 0 and 10 degrees from a tangential surface of the outer wall.

### Claim 6 (depends on 1)

The system of claim 1, wherein the at least one reactor inlet is configured to introduce an inert gas to the reactor vessel.

### Claim 7 (depends on 1)

The system of claim 1, wherein the heat source is configured to assist in maintaining an average temperature of the precursor gas less than an average temperature of the porous preform.

### Claim 8 (depends on 1)

The system of claim 1, wherein the heat source is configured to directly heat the outer wall through conduction.

### Claim 9 (depends on 1)

The system of claim 1, wherein the heat source is structurally joined with the outer wall.

### Claim 10 (depends on 9)

The system of claim 9, wherein the heat source comprises a fluid heater and cooler configured to heat the reactor vessel with a hot fluid and cool the reactor vessel with a cooler fluid.

### Claim 11 (depends on 1)

The system of claim 1, wherein the heat source is configured to operate at different temperatures for different axial positions on the reactor vessel.

### Claim 12 (depends on 1)

The system of claim 1, wherein the heat source further comprises a preheater configured to heat the precursor gas to a selected temperature.

### Claim 13 (depends on 1)

The system of claim 1, wherein the at least one reactor outlet is positioned at an angle near tangent to the outer wall to direct flow circumferentially around the reactor vessel.

### Claim 14 (depends on 1)

The system of claim 1, wherein the at least one reactor outlet further comprises a plurality of reactor outlets distributed at least one of around the circumference of the outer wall or axially down the side of the outer wall.

### Claim 15 (depends on 1)

The system of claim 1, wherein the at least one reactor outlet further comprises a control valve configured to maintain a particular pressure in the reactor vessel.

### Claim 16 (depends on 1)

The system of claim 1, further comprising a vacuum pump coupled to the at least one reactor outlet and configured to create suction pressure for the reactor vessel.

### Claim 17 (depends on 1)

The system of claim 1, further comprising a controller configured to:
control the heat source to heat the reactor vessel including the porous preform in the radially central core region of the reactor vessel;
control the at least one reactor inlet in the outer wall of the reactor vessel to introduce the precursor gas to the reactor vessel to produce swirling flow of the precursor gas around the radially central core region of the reactor vessel; and
control the at least one reactor outlet to remove the exhaust gas from the reactor vessel.

### Claim 18 (depends on 17)

The system of claim 17, wherein the controller is further configured to:
control the heat source to produce an average temperature of the precursor gas and an average temperature of the porous preform that are substantially the same;
control the at least one reactor outlet to produce a dynamic pressure of the reactor vessel that is greater than a pressure in the porous preform.

### Claim 19 (depends on 17)

The method of claim 17, wherein the controller is further configured to:
control the heat source to produce an average temperature of the precursor gas that is less than an average temperature of the porous preform; and
control the at least one reactor outlet to produce a dynamic pressure of the reactor vessel and a pressure in the porous preform that are substantially the same.

### Claim 20 (depends on 17)

The system of claim 17, wherein the controller is further configured to:
control the heat source to produce an average temperature of the precursor gas that is less than an average temperature of the porous preform; and
control the at least one reactor outlet to produce a dynamic pressure of the reactor vessel that is greater than a pressure in the preform.
