# US 2019/0169735 A1 · Carbon-based Nano-thin Film for Enhancing Surface Abrasion Resistance on Sapphire Thin Film

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- Number: US 2019/0169735 A1
- Document ID: US20190169735A1
- Status: Published application
- Kind: A1
- Application number: 16/266,113
- Filed: 2019-02-04
- Published: 2019-06-06
- Earliest claimed: 2011-12-23
- Assignees: Hong Kong Baptist University
- Applicants: Hong Kong Baptist University
- Inventors: Kok Wai CHEAH; Shing Chi TSE; Hoi Lam TAM
- Web page: https://patentgrep.com/patent/US20190169735A1

## CPC

- C23C 14/081: {of aluminium, magnesium or beryllium}
- C03C 3/06: with more than 90% silica by weight, e.g. quartz {(C03C3/045 takes precedence)}
- C03C 17/245: by deposition from the vapour phase
- C03C 17/3441: {comprising carbon, a carbide or oxycarbide}
- C03C 17/36: at least one coating being a metal
- C03C 17/3639: {Multilayers containing at least two functional metal layers}
- C03C 17/3644: {the metal being silver}
- C03C 17/3649: {made of metals other than silver}
- C23C 14/024: {Deposition of sublayers, e.g. to promote adhesion of the coating (C23C14/027 takes precedence)}
- C23C 14/025: {Metallic sublayers}
- C23C 14/0605: {Carbon}
- C23C 14/10: Glass or silica
- C23C 14/221: {Ion beam deposition (C23C14/46, C23C14/48 take precedence)}
- C23C 14/30: by electron bombardment
- C23C 14/34: Sputtering
- C23C 14/3464: {using more than one target (C23C14/56 takes precedence)}
- C23C 14/5806: {Thermal treatment}
- C23C 16/26: Deposition of carbon only
- C03C 2217/214: Al2O3
- C03C 2217/78: Coatings specially designed to be durable, e.g. scratch-resistant
- C03C 2218/15: from the vapour phase
- C03C 2218/32: After-treatment
- C03C 2218/328: Partly or completely removing a coating
- C03C 2218/33: by etching
- C23C: COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion B21C23/22; covering with metal by connecting pre-existing layers to articles, see the relevant places, e.g. B21D39/00, B23K; metallising of glass C03C; metallising mortars, concrete, artificial stone, ceramics or natural stone C04B41/00; enamelling of, or applying a vitreous layer to, metals C23D; treating metal surfaces or coating of metals by electrolysis or electrophoresis C25D; single-crystal film growth C30B; by metallising textiles D06M11/83; decorating textiles by locally metallising D06Q1/04)
- C03C: CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS

## Abstract

The present disclosure relates to display, windows, camera cover, lens and lens cover, optical/infra-red sensors, glasses and spectacles.

## Claims

### Claim 1

A method of enhancing surface abrasion resistance on a substrate comprising depositing a carbon-based film with a thickness of no more than 100 nm on to said substrate such that the carbon-based film deposited substrate has an optical transmittance of at least 70%.

### Claim 2 (depends on 1)

The method of claim 1, wherein the substrate comprises glass, quartz, fused silica, metals and sapphire.

### Claim 3 (depends on 1)

The method of claim 1, wherein said depositing comprises physical vapor deposition and/or chemical vapor deposition.

### Claim 4 (depends on 3)

The method of claim 3, wherein the physical vapor deposition comprises DC sputtering, RF sputtering, thermal evaporation, and e-beam evaporation.

### Claim 5 (depends on 3)

The method of claim 3, wherein said chemical vapor deposition is plasma enhanced chemical vapor deposition.

### Claim 6 (depends on 1)

The method of claim 1, wherein said deposition is carried out in a temperature from about room temperature to about 800° C.

### Claim 7 (depends on 1)

The method of claim 1, wherein said carbon-based film comprises one or more of C60, carbon nano-tube, graphene, graphite, diamond-like carbon, and/or metal.

### Claim 8 (depends on 7)

The method of claim 7, wherein the carbon-based film comprises graphite and metal in which the metal is deposited as a precursor to enhance adhesion between the substrate and the carbon-based film, and wherein the thickness ratio between the metal layer and the carbon-based film is no more than 1:10.

### Claim 9 (depends on 7)

The method of claim 7, wherein the metal is deposited by physical vapor deposition comprising DC sputtering, RF sputtering and e-beam evaporation.

### Claim 10 (depends on 7)

The method of claim 7 wherein said metal comprises aluminium, silver, chromium, titanium, and magnesium.

### Claim 11 (depends on 7)

The method of claim 7, wherein said metal is deposited at a temperature from about room temperature to 900° C.

### Claim 12 (depends on 2)

The method of claim 2, wherein the carbon-based film deposited sapphire has a hardness of up to 9.5 mohs.

### Claim 13 (depends on 1)

The method of claim 1, wherein the carbon-based film deposited substrate has an optical transmittance of 70-99%.

### Claim 14 (depends on 1)

The method of claim 1, wherein the thickness of the carbon-based film is less than 30 nm.

### Claim 15 (depends on 1)

A sapphire film coated substrate prepared by the method of claim 1.