# US 2019/0168265 A1 · Compositions and methods for reducing interaction between abrasive particles and a cleaning brush

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- Number: US 2019/0168265 A1
- Document ID: US20190168265A1
- Status: Published application
- Kind: A1
- Application number: 16/172,139
- Filed: 2018-10-26
- Published: 2019-06-06
- Earliest claimed: 2017-12-04
- Assignees: Entegris, Inc.
- Applicants: Entegris, Inc.
- Inventors: Daniela WHITE
- Web page: https://patentgrep.com/patent/US20190168265A1

## CPC

- B08B 1/12: Brushes
- A46B 13/00: Brushes with driven brush bodies {or carriers}(power-driven toothbrushes A61C17/16)
- B08B 1/20: Cleaning of moving articles, e.g. of moving webs or of objects on a conveyor
- B08B 1/52: using fluids
- B08B 3/04: Cleaning involving contact with liquid
- B08B 3/08: the liquid having chemical or dissolving effect
- B24B 37/34: Accessories
- C11D 3/2086: {Hydroxy carboxylic acids-salts thereof}
- C11D 3/30: Amines; Substituted amines {; Quaternized amines}
- C11D 3/3765: {in liquid compositions}
- C11D 7/10: Salts
- C11D 7/261: {Alcohols; Phenols}
- C11D 7/265: {Carboxylic acids or salts thereof}
- C11D 7/3218: {Alkanolamines or alkanolimines}
- C11D 7/3245: {Aminoacids}
- C11D 7/3272: {Urea, guanidine or derivatives thereof}
- C11D 7/3281: {Heterocyclic compounds}
- C11D 7/329: {Carbohydrate or derivatives thereof}
- C11D 7/34: containing sulfur
- H10P 72/0412: {using mainly scrubbing means, e.g. brushes}
- C11D 2111/22: Electronic devices, e.g. PCBs or semiconductors
- B08B: CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- A46B: BRUSHES (handles not integral with brushware B25G)
- B24B: MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING (grinding of gear teeth B23F, of screw-threads B23G1/36; by electro-erosion B23H; abrasive or related blasting B24C; tools for grinding, buffing or sharpening B24D; polishing compositions C09G1/00; abrasives C09K3/14; electrolytic etching or polishing C25F3/00; grinding arrangements for use on assembled railway tracks E01B31/17); DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- C11D: DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- H10P: GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10

## Abstract

Described are methods for removing abrasive particles from a polymeric surface, such as from a polymeric surface of a cleaning brush used in a post chemical-mechanical processing cleaning step, as well as related cleaning solutions.

## Claims

### Claim 1

A method of removing abrasive particles from a post-chemical-mechanical-processing (post-CMP) cleaning brush, the method comprising:
providing a post-CMP cleaning brush having a polymeric surface and having abrasive particle residue at the polymeric surface,
providing a cleaning solution having a pH below 7, the cleaning solution comprising:
cleaning agent and
particle removal agent, and
removing abrasive particle residue from the polymeric surface by contacting the polymeric surface with the cleaning solution.

### Claim 2

A method of post-chemical-mechanical-processing (post-CMP) cleaning of a substrate, the method comprising:
providing a post-CMP cleaning brush having a polymeric surface,
providing a cleaning solution that comprises:
cleaning agent and
particle removal agent,
providing a substrate that includes a surface, with residue at the substrate surface, the residue including abrasive particles, and
removing residue from the substrate surface by exposing the substrate surface and the polymeric surface to the cleaning solution while contacting the substrate surface with the polymeric surface and while moving the substrate surface relative to the polymeric surface.

### Claim 3 (depends on 1)

The method of claim 1, wherein the cleaning solution has a pH in a range from about 1 to

### Claim 4 (depends on 1)

The method of claim 1, wherein the polymeric surface includes polymer that contains hydrogen bonding groups.

### Claim 5 (depends on 4)

The method of claim 4, wherein the polymer is made from monomer that comprises a vinyl alcohol monomer.

### Claim 6 (depends on 1)

The method of claim 1, wherein the particle removal agent includes one or more hydrogen bonding groups.

### Claim 7 (depends on 6)

The method of claim 6, wherein the hydrogen bonding groups are: a carboxylic acid, an amino group, an alcohol, a phosphine, phosphate, phosphonate, an alkanolamine, a carbamide, a urea, urethane, ester, a betaine, a silanol group or a sulfur-containing group.

### Claim 8 (depends on 6)

The method of claim 6, wherein the particle removal agent is: a carboxylic acid compound, an amino acid compound, a polyol with at least 3 hydroxy groups, a polyalkyleneoxide homo- or copolymer, an amine-containing homopolymer or copolymer.

### Claim 9 (depends on 8)

The method of claim 8, wherein the particle removal agent is: lactic acid, maleic acid, urea, glycolic acid, sorbitol, borax (i.e., sodium borate), proline, a betaine, glycine, histidine, TRIS (tris(hydroxymethyl) aminomethane), dimethyl sulfoxide, sulfolane, glycerol, sorbitol, xylitol, fructose, mannitol, arabinol, and dextran or a combination thereof.

### Claim 10 (depends on 1)

The method of claim 1, wherein the abrasive particles exhibit a positive charge at the pH of the cleaning solution.

### Claim 11 (depends on 1)

The method of claim 1, wherein the abrasive particles include hydrogen bonding groups at surfaces of the particles.

### Claim 12 (depends on 11)

The method of claim 11, wherein the hydrogen bonding group is a silanol (SiOH) group.

### Claim 13 (depends on 1)

The method of claim 1, wherein the abrasive particles are selected from: silica particles, ceria particles, ceria oxide particles, alumina particles, titanium dioxide, zirconia, diamonds or silicon carbide particles or a combination thereof.

### Claim 14 (depends on 1)

The method of claim 1, wherein the cleaning agent comprises one or more of a chelating agent and an organic solvent.

### Claim 15 (depends on 1)

The method of claim 1, wherein the cleaning agent comprises citric acid, monoethanol amine, polyacrylic acid, or a combination thereof.

### Claim 16

A cleaning solution concentrate useful for cleaning a substrate in a post-chemical-mechanical processing step, the cleaning solution comprising:
cleaning agent, and
at least 0.1 weight percent particle removal agent that includes a hydrogen bonding group.

### Claim 17 (depends on 16)

The concentrate of claim 16 comprising:
from 0.1 to 20 weight percent cleaning agent, and
from 0.1 to 20 weight percent of the particle removal agent.

### Claim 18 (depends on 16)

The concentrate of claim 16, wherein the cleaning agent comprises one or more of a chelating agent and an organic solvent.

### Claim 19 (depends on 16)

The concentrate of claim 16, wherein the cleaning agent comprising citric acid, monoethanol amine, polyacrylic acid, or a combination thereof.

### Claim 20 (depends on 16)

The concentrate of claim 16, wherein the cleaning solution as a pH that is below 2.5.