Semiconductor device having improved trench and electrode structures

Abstract

A semiconductor device may comprise a substrate; a trench formed in the substrate and filled with an insulating layer; and a gate electrode and a source embedded in the insulating layer. The gate electrode and the source electrode may be positioned in the insulating layer in the trench above and below each other. From a cross-sectional perspective, the gate electrode and the source electrode are not overlapped in horizontal or vertical direction. The trench may extend to a first depth of a bottom surface of the trench below the gate electrode, and may extend to a second depth of the bottom surface of the trench below the source electrode. The first depth and the second depth may be different.

Dependencies are inferred from the claim text.