Semiconductor device and manufacturing method thereof
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsKuo-Cheng CHING, Ching-Wei TSAI, Kuan-Lun CHENG, Chih-Hao WANG
Life of this patent
Estimating the term…
Abstract
A semiconductor device includes a substrate, a semiconductor fin, an isolation plug, and an isolation structure. The semiconductor fin is over the substrate. The isolation plug is over the substrate and adjacent to an end of the semiconductor fin. The isolation structure is over the substrate and adjacent to sidewalls of the semiconductor fin and the isolation plug. A top surface of the isolation structure is in a position lower than a top surface of the isolation plug.
Claims20
A semiconductor device comprising:
- a substrate;
- a semiconductor fin over the substrate;
- an isolation plug over the substrate and adjacent to an end of the semiconductor fin;
- and
- an isolation structure over the substrate and adjacent to sidewalls of the semiconductor fin and the isolation plug, wherein a top surface of the isolation structure is in a position lower than a top surface of the isolation plug.
A semiconductor device comprising:
- a substrate;
- a first semiconductor fin and a second semiconductor fin over the substrate, wherein an end of the first semiconductor fin opposes an end of the second semiconductor fin;
- an isolation plug between the ends of the first and second semiconductor fins;
- an isolation structure surrounding the first and second semiconductor fins and the isolation plug;
- and
- a gate electrode over the isolation plug.
A method for manufacturing a semiconductor device comprising:
- forming first and second semiconductor fins over a substrate, wherein ends of the first and second semiconductor fins are opposite each other;
- forming an isolation plug between the ends of the first and second semiconductor fins;
- forming an isolation structure surrounding the first and second semiconductor fins and the isolation plug;
- and
- forming a gate electrode over the isolation plug.
Dependencies are inferred from the claim text.