Array substrate and manufacturing method thereof, sensor and detection device
AssigneesBoe Technology Group Co., Ltd., Ka Imaging Inc.
InventorChia Chiang LIN
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Abstract
Disclosed are an array substrate, a manufacturing method thereof, a sensor and a detection device. The array substrate includes: a base substrate; a thin-film transistor (TFT) being disposed on the base substrate and including a source electrode and an active layer; a passivation layer disposed on the TFT; a first metal layer disposed on the passivation layer; an insulating layer disposed on the first metal layer; a through hole structure running through the insulating layer, the first metal layer and the passivation layer; and a detection unit being disposed on the insulating layer and including a second metal layer, wherein the second metal layer makes direct contact with the source electrode via the through hole structure.
Claims12
An array substrate, comprising:
- a base substrate;
- a thin-film transistor (TFT) being disposed on the base substrate and including a source electrode and an active layer;
- a passivation layer disposed on the TFT;
- a first metal layer disposed on the passivation layer;
- an insulating layer disposed on the first metal layer;
- a through hole structure running through the insulating layer, the first metal layer and the passivation layer;
- and
- a detection unit being disposed on the insulating layer and including a second metal layer, wherein
- the second metal layer makes direct contact with the source electrode via the through hole structure.
The array substrate according to claim I, wherein a projection of the first metal layer on the base substrate is at least partially overlapped with a projection of the TFT on the base substrate.
The array substrate according to claim I, wherein a transparent conductive layer is disposed on the second metal layer.
Dependencies are inferred from the claim text.